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How To Make a Nanodiamond
A Simple Tool for Positional Diamond Mechanosynthesis, and its Method of Manufacture
Robert A. Freitas Jr. has filed the first known patent application on positional mechanosynthesis, which is also the first on positional diamond mechanosynthesis. The "Freitas process" -- more fully described here -- is a method for building a tool for molecularly precise fabrication of physical structures. Methods of making diamondoid structures are detailed here, but the same toolbuilding process can be extended to other materials, mechanosynthetic processes, and structures. And those tools can be used to create bigger structures, which ....
Originally published on MolecularAssembler.com
January 12, 2004. Published on KurzweilAI.net January 27, 2006.
This is the complete original document describing the "Freitas
process" to the level of detail that was known on 12 January 2004,
following its initial conception on 1 November 2003. The actual
Provisional Patent Application, prepared subsequently with the assistance
of legal counsel, was abstracted from (and thus differs in some
particulars from) this complete original document. A full utility
patent on this process (containing numerous claims and some additional
material, running a total of 133 pages in length) was subsequently
filed on 11 February 2005. This patent is now pending before the
USPTO. It is the first known patent ever filed on positional mechanosynthesis,
and the first known patent ever filed on positional diamond mechanosynthesis.
Note: Philip Moriarty at the University of Nottingham (U.K.)
has posted online several technical objections to one of the two
proposed toolbuilding pathways, which Freitas says he is currently
working through, point by point, with Moriarty via private correspondence
in the manner of a friendly collaboration.
Abstract. A method is described for building
a mechanosynthesis tool intended to be used for the molecularly
precise fabrication of physical structures–as for example,
diamond structures. The exemplar tool consists of a bulk-synthesized
dimer-capped triadamantane tooltip molecule which is initially attached
to a deposition surface in tip-down orientation, whereupon CVD or
equivalent bulk diamond deposition processes are used to grow a
large crystalline handle structure around the tooltip molecule.
The large handle with its attached tooltip can then be mechanically
separated from the deposition surface, yielding an integral finished
tool that can subsequently be used to perform diamond mechanosynthesis
in vacuo. The present disclosure is the first description of a complete
tool for positional diamond mechanosynthesis, along with its method
of manufacture. The same toolbuilding process may be extended to
other classes of tooltip molecules, other handle materials, and
to mechanosynthetic processes and structures other than those involving
diamond.
OUTLINE
Abstract
1.Background of the Invention
1.1 Conventional Diamond Manufacturing
1.2 Diamond Manufacturing via Positional Diamond
Mechanosynthesis
2. Description of the Invention
2.1 STEP 1: Synthesis of Capped Tooltip Molecule
2.2 STEP 2: Attach Tooltip Molecule to Deposition
Surface in Preferred Orientation
2.2.1 Surface Nucleation and Choice of Deposition
Substrate
2.2.2 Tooltip Attachment Method A: Ion Bombardment
in Vacuo
2.2.3 Tooltip Attachment Method B: Surface Decapping
in Vacuo
2.2.4 Tooltip Attachment Method C: Solution Chemistry
2.3 STEP 3: Attach Handle Structure to Tooltip Molecule
2.3.1 Handle Attachment Method A: Nanocrystal
Growth
2.3.2 Handle Attachment Method B: Direct Handle
Bonding
2.4 STEP 4: Separate Finished Tool from Deposition
Surface
References
1. Background of the Invention
The properties of diamond, such
as its extraordinary hardness, coefficient of friction, tensile
strength and low compressibility, electrical resistivity, electrical
carrier (electron and hole) mobility, high energy bandgap and saturation
velocity, dielectric breakdown strength, low neutron cross-section
(radiation-hardness), thermal conductivity, thermal expansion resistance,
optical transmittance and refractive index, and chemical inertness
allow this material to serve a vital role in a wide variety of industrial
and technical applications.
The present invention relates
generally to methods for the manufacture of synthetic diamond. More
particularly, the invention is concerned with the physical structure
and method of manufacture of a tool, which can itself subsequently
be employed in the mechanosynthetic manufacture of other molecularly
precise diamond structures. However, the same toolbuilding process
is readily extended to other classes of tooltip molecules, handle
materials, and mechanosynthetic processes and structures other than
diamond.
1.1 Conventional Diamond Manufacturing
All prior art methods of manufacturing diamond
are bulk processes in which the diamond crystal structure is manufactured
by statistical processes. In such processes, new atoms of carbon
arrive at the growing diamond crystal structure having random positions,
energies, and timing. Growth extends outward from initial nucleation
centers having uncontrolled size, shape, orientation and location.
Existing bulk processes can be divided into three principal methods
– high pressure, low pressure hydrogenic, and low pressure
nonhydrogenic.
(A) In the first or high
pressure bulk method of producing diamond artificially, powders
of graphite, diamond, or other carbon-containing substances are
subjected to high temperature and high pressure to form crystalline
diamond. High pressure processes are of several types [1]:
(1) Impact Process. The
starting powder is instantaneously brought under high pressure by
applying impact generated by, for example, the explosion of explosives
and the collision of a body accelerated to a high speed. This produces
granular diamond by directly converting the starting powder material
having a graphite structure into a powder composed of grains having
a diamond structure. This process has the advantage that no press
as is required, as in the two other processes, but there is difficulty
in controlling the size of the resulting diamond products. Nongraphite
organic compounds can also be shock-compressed to produce diamond
[2].
(2) Direct Conversion
Process. The starting powder is held under a high static pressure
of 13-16 GPa and a high temperature of 3,000-4,000 oC in a sealed
high pressure vessel. This establishes stability conditions for
diamond, so the powder material undergoes direct phase transition
from graphite into diamond, through graphite decomposition and structural
reorganization into diamond. In both direct conversion and flux
processes, a press is widely used and enables single crystal diamonds
to be grown as large as several millimeters in size.
(3) Flux Process. As
in direct conversion, a static pressure and high temperature are
applied to the starting material, but here fluxes such as Ni and
Fe are added to allow the reaction to occur under lower pressure
and temperature conditions, accelerating the atomic rearrangement
which occurs during the conversion process. For example, high-purity
graphite powder is heated to 1500-2000 oC under 4-6 GPa of pressure
in the presence of iron catalyst, and under this extreme, but equilibrium,
condition of pressure and temperature, graphite is converted to
diamond: The flux becomes a saturated solution of solvated graphite,
and because the pressure inside the high pressure vessel is maintained
in the stability range for diamond, the solubility for graphite
far exceeds that for diamond, leading to diamond precipitation and
dissolution of graphite into the flux. Every year about 75 tons
of diamond are produced industrially this way [14].
(B) In the second or low
pressure hydrogenic bulk method of producing diamond artificially,
widely known as CVD or Chemical Vapor Deposition, hydrogen (H2)
gas mixed with a few percent of methane (CH4) is passed over a hot
filament or through a microwave discharge, dissociating the methane
molecule to form the methyl radical (CH3) and dissociating the hydrogen
molecule into atomic hydrogens (H). Acetylene (C2H2) can also be
used in a similar manner as a carbon source in CVD. Diamond or diamond-like
carbon films can be grown by CVD epitaxially on diamond nuclei,
but such films invariably contain small contaminating amounts (0.1-1%)
of hydrogen which gives rise to a variety of structural, electronic
and chemical defects relative to pure bulk diamond. Currently, diamond
synthesis from CVD is routinely achieved by more than 10 different
methods [163].
As noted by McCune and Baird [3],
a diamond particle is a special cubic lattice grown from a single
nucleus of four-coordinated carbon atoms. The diamond-cubic lattice
consists of two interpenetrating face-centered cubic lattices, displaced
by one quarter of the cube diagonal. Each carbon atom is tetrahedrally
coordinated, making strong, directed sp3 bonds to its neighbors
using hybrid atomic orbitals. The lattice can also be visualized
as planes of six-membered saturated carbon rings stacked in an ABC
ABC ABC sequence along <111> directions. Each ring is in the
“chair” conformation and all carbon-carbon bonds are
staggered. A lattice with hexagonal symmetry, lonsdaleite, can be
constructed with the same tetrahedral nearest neighbor configuration.
In lonsdaleite, however, the planes of chairs are stacked in an
AB AB AB sequence, and the carbon-carbon bonds normal to these planes
are eclipsed. In simple organic molecules, the eclipsed conformation
is usually less stable than the staggered because steric interactions
are greater. Thermodynamically, diamond is slightly unstable with
respect to crystalline graphite. At 298 K and 1 atm the free energy
difference is 0.026 eV per atom, only slightly greater than kBT,
where kB is the Boltzmann constant and T is the absolute temperature
in degrees Kelvin.
The basic obstacle to crystallization of diamond
at low pressures is the difficulty in avoiding co-deposition of
graphite and/or amorphous carbon when operating in the thermodynamically
stable region of graphite [3].
In general, the possibility of forming different bonding networks
of carbon atoms is understandable from their ability to form different
electronic configurations of the valence electrons. These bond types
are classified as sp3 (tetrahedral), sp2 (planar), and sp1 (linear),
and are related to the various carbon allotropes including cubic
diamond and hexagonal diamond or lonsdaleite (sp3), graphite (sp2),
and carbenes (sp1), respectively.
Hydrogen is generally regarded as an essential
part of the reaction steps in forming diamond film during CVD, and
atomic hydrogen must be present during low pressure diamond growth
to: (1) stabilize the diamond surface, (2) reduce the size of the
critical nucleus, (3) “dissolve” the carbon in the feedstock
gas, (4) produce carbon solubility minimum, (5) generate condensable
carbon radicals in the feedstock gas, (6) abstract hydrogen from
hydrocarbons attached to the surface, (7) produce vacant surface
sites, (8) etch (regasify) graphite, hence suppressing unwanted
graphite formation, and (9) terminate carbon dangling bonds [4,
6]. Both diamond and graphite are
etched by atomic hydrogen, but for diamond, the deposition rate
exceeds the etch rate during CVD, leading to diamond (tetrahedral
sp3 bonding) growth and the suppression of graphite (planar sp2
bonding) formation. (Note that most potential atomic hydrogen substitutes
such as atomic halogens etch graphite at much higher rates than
atomic hydrogen [4].)
Low pressure or CVD hydrogenic metastable diamond
growth processes are of several types [3-5]:
(1) Hot Filament Chemical
Vapor Deposition (HFCVD). Filament deposition involves the use of
a dilute (0.1-2.5%) mixture of hydrocarbon gas (typically methane)
and hydrogen gas (H2) at 50-1000 torr which is introduced via a
quartz tube located just above a hot tungsten filament or foil which
is electrically heated to a temperature ranging from 1750-2800 oC.
The gas mixture dissociates at the filament surface, yielding dissociation
products consisting mainly of radicals including CH3, CH2, C2H,
and CH, acetylene, and atomic hydrogen, as well as unreacted CH4
and H2. A heated deposition substrate placed just below the hot
tungsten filament is held in a resistance heated boat (often molybdenum)
and maintained at a temperature of 500-1100 oC, whereupon diamonds
are condensed onto the heated substrate. Filaments of W, Ta, and
Mo have been used to produce diamond. The filament is typically
placed within 1 cm of the substrate surface to minimize thermalization
and radical recombination, but radiation heating can produce excessive
substrate temperatures leading to nonuniformity and even graphitic
deposits. Withdrawing the filament slightly and biasing it negatively
to pass an electron current to the substrate assists in preventing
excessive radiation heating.
(2) High Frequency Plasma-Assisted
Chemical Vapor Deposition (PACVD). Plasma deposition involves the
addition of a plasma discharge to the foregoing filament process.
The plasma discharge increases the nucleation density and growth
rate, and is believed to enhance diamond film formation as opposed
to discrete diamond particles. There are three basic plasma systems
in common use: a microwave plasma system, a radio frequency or RF
(inductively or capacitively coupled) plasma system, and a direct
current or DC plasma system. The RF and microwave plasma systems
use relatively complex and expensive equipment which usually requires
complex tuning or matching networks to electrically couple electrical
energy to the generated plasma. The diamond growth rate offered
by these two systems can be quite modest, on the order of ~1 micron/hour.
Diamonds can also be grown in microwave discharges in a magnetic
field, under conditions where electron cyclotron resonance is considerably
modified by collisions. These “magneto-microwave” plasmas
can have significantly higher densities and electron energies than
isotropic plasmas and can be used to deposit diamond over large
areas.
(3) Oxyacetylene Flame-Assisted
Chemical Vapor Deposition. Flame deposition of diamond occurs via
direct deposit from acetylene as a hydrocarbon-rich oxyacetylene
flame. In this technique, conducted at atmospheric pressure, a specific
part of the flame (in which both atomic hydrogen (H) and carbon
dimers (C2) are present [19]) is played on a
substrate on which diamond grows at rates as high as >100 microns/hour
[7].
(C) In the third or low
pressure nonhydrogenic bulk method of producing diamond artificially
[8-17], a nonhydrogenic fullerene
(e.g., C60) vapor suspended in a noble gas stream or a vapor of
mixed fullerenes (e.g., C60, C70) is passed into a microwave chamber,
forming a plasma in the chamber and breaking down the fullerenes
into smaller fragments including isolated carbon dimer radicals
(C2) [6]. (Often a small amount of H2, e.g., ~1%,
is added to the feedstock gas.) These fragments deposit onto a single-crystal
silicon wafer substrate, forming a thickness of good-quality smooth
nanocrystalline diamond (15 nm average grain size, range 10-30 nm
crystallites [8-10]) or ultrananocrystalline
diamond (UNCD) diamond films with intergranular boundaries free
from graphitic contamination [9], even when examined
by high resolution TEM [16] at atomic resolution
[10]. Fullerenes are allotropes of carbon, containing
no hydrogen, so diamonds produced from fullerene precursors are
hydrogen-defect free [11] – indeed, the
Ar/C60 film is close in both smoothness and hardness to a cleaved
single crystal diamond sample [10]. The growth
rate of diamond film is ~1.2 microns/hour, comparable to the deposition
rate observed using 1% methane in hydrogen under similar system
deposition conditions [9, 10].
Diamond films can, using this process, be grown at relatively low
temperatures (<500 oC) [10] as opposed to
conventional diamond growth processes which require substrate temperatures
of 800-1000 oC.
Ab initio calculations indicate that C2
insertion into carbon-hydrogen bonds is energetically favorable
with small activation barriers, and that C2 insertion into carbon-carbon
bonds is also energetically favorable with low activation barriers
[15]. A mechanism for growth on the diamond C(100)
(2x1):H reconstructed surface with C2 has been proposed [16].
A C2 molecule impinges on the surface and inserts into a surface
carbon-carbon dimer bond, after which the C2 then inserts into an
adjacent carbon-carbon bond to form a new surface carbon dimer.
By the same process, a second C2 molecule forms a new surface dimer
on an adjacent row. Then a third C2 molecule inserts into the trough
between the two new surface dimers, so that the three C2 molecules
incorporated into the diamond surface form a new surface dimer row
running perpendicular to the previous dimer row. This C2 growth
mechanism requires no hydrogen abstraction reactions from the surface
and in principle should proceed in the absence of gas phase atomic
hydrogen.
The UNCD films were grown on silicon (Si) substrates
polished with 100 nm diamond grit particles to enhance nucleation
[16]. Deposition of UNCD on a sacrificial release
layer of SiO2 substrate is very difficult because the nucleation
density is 6 orders of magnitude smaller on SiO2 than on Si [18].
However, the carbon dimer growth species in the UNCD process can
insert directly into either the Si or SiO2 surface, and the lack
of atomic hydrogen in the UNCD fabrication process permits both
a higher nucleation density and a higher renucleation rate than
the conventional H2/CH4 plasma chemistry [18],
so it is therefore possible to grow UNCD directly on SiO2.
Besides fullerenes, it has been proposed that
“diamondoids” or polymantanes, small hydrocarbons made
of one or more fused cages of adamantane (C10H16, the smallest unit
cell of hydrogen-terminated crystalline diamond) could be used as
the carbon source in nonhydrogenic diamond CVD [20-22].
Dahl, Carlson and Liu [22] suggest that the injection
of diamondoids could facilitate growth of CVD-grown diamond film
by allowing carbon atoms to be deposited at a rate of about 10-100
or more at a time, unlike conventional plasma CVD in which carbons
are added to the growing film one atom at a time, possibly increasing
diamond growth rates by an order of magnitude or better. However,
Plaisted and Sinnott [23] used atomistic simulations
to study thin-film growth via the deposition of very hot (119-204
eV/molecule; 13-17 km/sec) beams of adamantane molecules on hydrogen-terminated
diamond (111) surfaces, with forces on the atoms in the simulations
calculated using a many-body reactive empirical potential for hydrocarbons.
During the deposition process the adamantane molecules react with
one another and the surface to form hydrocarbon thin films that
are primarily polymeric with the amount of adhesion depending strongly
on incident energy. Despite the fact that the carbon atoms in the
adamantane molecules are fully sp3 hybridized, the films contain
primarily sp2 hybridized carbon with the percentage of sp2 hybridization
increasing as the incident velocity goes up. However, cooler beams
might allow more consistent sp3 diamond deposition, and other techniques
[24] have deposited diamond-like carbon (DLC)
films with a higher percentage of sp3 hybridization from adamantane.
1.2 Diamond Manufacturing via Positional Diamond
Mechanosynthesis
A new non-bulk non-statistical method of manufacturing
diamond, called positional diamond mechanosynthesis, was proposed
theoretically by Drexler in 1992 [32]. In this
method, positionally controlled carbon deposition tools are manipulated
to sub-Angstrom tolerances via SPM (Scanning Probe Microscopy) or
similar atomic-resolution manipulator mechanisms to build diamond
in vacuo. Each carbon deposition tool includes a tooltip molecule
attached to a larger handle structure which is grasped by the atomic-resolution
manipulator mechanism. One or more carbon atoms having one or more
dangling bonds are relatively loosely bound to the tip of the tooltip
molecule. When the tip is brought into contact with the substrate
surface at a specific location and sufficient mechanical forces
(compression, torsion, etc.) are applied, a stronger covalent bond
is formed between the tip-bound carbon atom(s) and the surface,
via the dangling bonds, than previously existed between the tip-bound
carbon atom(s) and the tooltip structure. As a result, the tool
may subsequently be retracted from the substrate and the tip-bound
carbon atom(s) will be left behind on the substrate surface at the
specific location and orientation desired. By repeating this process
of positionally-constrained chemistry or mechanosynthesis, using
a succession of similar tools, a large variety of molecularly precise
diamond structures can be fabricated, placing one or a few atoms
at a time on the growing workpiece.
Several analyses using the increasingly accurate
methods of computational chemistry have confirmed the theoretical
validity of the proposed process of positional diamond mechanosynthesis
for hydrogen abstraction [25-33]
and hydrogen donation [32, 33],
in respect to the surface passivating hydrogen atoms, and carbon
deposition [32-38], in respect
to diamond surfaces and the body of diamond nanostructures. While
positional diamond mechanosynthesis has not yet been demonstrated
experimentally, early experiments [39] have demonstrated
single-molecule positional covalent bond formation on surfaces via
SPM, though in these cases bond formation was not purely mechanochemical
but included electrochemical or other means. Mechanosynthesis of
the Si(111) lattice has been studied theoretically [40,
41] and the first laboratory demonstration of
nonelectrical, purely mechanical positional covalent bond formation
on a silicon surface using a simple SPM tip was reported in 2003
[42]. In this demonstration, Osaka University
researchers lowered a silicon AFM tip toward the silicon Si(111)-(7x7)
surface and pushed down on a single atom. The focused pressure forced
the atom free of its bonds to neighboring atoms, which allowed it
to bind to the AFM tip. After lifting the tip and imaging the material,
there was a hole where the atom had been (Figure
1). Pressing the tip back into the vacancy redeposited the tip-bound
selected single atom, this time using the pressure to break the
bond with the tip. These manipulation processes were purely mechanical
since neither bias voltage nor voltage pulse was applied between
probe and sample [42].
Figure 1. Mechanosynthesis of a single
silicon atom on the silicon Si(111)-(7x7) surface
Phys. Rev. Lett.
90, 176102 (2003)
Existing mechanosynthetic tools can only be used
at ultralow temperatures near absolute zero, and hold the atom or
molecule to be deposited only very weakly, and can be employed only
very slowly (minutes or hours per mechanosynthetic operation). These
tools include the simple diamond stylus [43]
and other crude tools such as nanocrystalline diamond grown (a)
on standard silicon [44, 48]
AFM tips with a 30 nm radius [48], (b) on silicon
cantilever tips [46, 47],
(c) on tungsten STM tips [45], or (d) on 12 nm
radius doped-diamond STM tips [49], using CVD
[44-49] including HFCVD [44,
46] or PACVD [45] diamond
deposition processes. There is a need for improved mechanosynthetic
tools with a molecularly precise <0.3 nm tip radius that can
operate at liquid nitrogen or even room temperatures, and can perform
mechanosynthetic operations in seconds or even faster cycle times,
and can conveniently be precisely manipulated to sub-Angstrom positional
accuracy using conventional SPM instruments.
In 2002, Merkle and Freitas [36]
proposed the first design for a class of precision tooltip molecules
intended to positionally deposit individual carbon dimers on a growing
diamond substrate via diamond mechanosynthesis (Figure
2), and subsequent theoretical analysis [37,
38, 235] has verified that
this class of tooltip molecules should be useful for depositing
carbon dimers on a dehydrogenated diamond C(110) crystal surface,
for the purpose of building additional C(110) surface or other molecularly
precise structures at liquid nitrogen or room temperatures.
Figure 2. DCB6-Si dimer placement
tooltip molecule [36]
(A) Wire frame view of tooltip molecule
(B) Overlapping spheres view of (A)
(C) Iceane
No specific proposals for attaching tooltip molecules
such as the one illustrated in Figure 2 A/B
to larger tool handles, or complete tools for positional diamond
mechanosynthesis, have previously been reported in the scientific,
engineering or patent literature. While others have previously noted
the need for a handle structure to manipulate the active mechanosynthetic
tooltip [32, 33, 36,
38], this invention is the first practical description
of how to manufacture and to attach tooltips to such a handle structure,
and thus to manufacture a complete mechanosynthetic tool.
The present invention is not limited to a method
for the manufacture of a complete tool which can be used for diamond
mechanosynthesis. The same toolbuilding process is readily extended
to other classes of tooltip molecules, handle materials, and mechanosynthetic
processes and structures other than diamond. As examples, which
in no way limit or exhaust the possible applications of this invention,
the same method as described herein can be used to build complete
mechanosynthetic tools and attach handles to: (1) other possible
C2 dimer deposition tooltips proposed by Drexler [32]
and Merkle [33, 34] for the
building of molecularly precise diamond structures; (2) other possible
carbon deposition tooltips, including but not limited to carbene
tooltips as proposed by Drexler [32] and Merkle
[33, 34] and monoradical methylene
tooltips as proposed by Freitas [234], for the
deposition of carbon or hydrocarbon moieties during the building
of molecularly precise diamond structures, or other tooltips that
may be used for the removal of individual carbon atoms, C2 dimers
[38], or other hydrocarbon moieties from a growing
diamond surface; (3) tooltips for the abstraction [25-33]
and donation [32, 33] of hydrogen
atoms, for the purpose of positional surface passivation or depassivation
during the building of molecularly precise diamond structures, or
during the building of molecularly precise structures other than
diamond, or of other atoms similarly employed for passivation purposes;
or (4) tooltips for the deposition or abstraction of atoms, dimers,
or other moieties, to or from materials including, but not limited
to, covalent solids other than diamond, silicon, germanium or other
semiconductors, intermetallics, ceramics, and metals.
2. Description of the Invention
The present invention is concerned with the physical
structure and method of manufacture of a complete tool for positional
diamond mechanosynthesis, which can subsequently be employed in
the mechanosynthetic manufacture of other molecularly precise diamond
structures, including other tools for positional diamond mechanosynthesis.
The present invention is the first description
of a complete tool for positional diamond mechanosynthesis, along
with its method of manufacture. The subject mechanosynthetic tool
is constructed using only bulk chemical and mechanical processes,
and yet, once fabricated, is capable of molecularly precise carbon
dimer deposition to produce molecularly precise diamond structures.
The present invention provides a tool by which the trajectory and
timing of each new carbon atom added to a growing diamond nanostructure
can be precisely controlled, thus allowing the manufacture of molecularly
precise three-dimensional diamond structures of specified size,
shape, orientation, location, and chemical composition, a significant
improvement over all known bulk methods for fabricating synthetic
diamond and a significant improvement over all existing mechanosynthetic
SPM tips or styluses.
The positional diamond mechanosynthesis tool
described herein enables the convenient manufacture of large numbers
and varieties of diamond mechanosynthesis tools of similar or improved
types, and also enables the convenient manufacture of a wide variety
of molecularly precise nanoscale, microscale, and other diamond
structures that cannot be fabricated by any known bulk process,
including, but not limited to, molecularly-sharp scanning probe
tips, shaped nanopores and custom binding sites, complex nanosensors,
interleaved nanomechanical structures, compact mechanical nanocomputer
components, nanoelectronic and quantum computational devices, aperiodically
nanostructured optical materials, and many other complex nanodevices,
nanomachines, and nanorobots. The tool can also be used in the fabrication
of additional tools for the positional mechanosynthetic manufacture
of molecularly precise structures made of materials other than diamond,
employing either carbon (e.g., nanotubes and other graphene sheet
structures) or carbon together with elements other than carbon,
such as nanostructured nondiamond hydrocarbons, nanostructured fluorocarbons,
nanostructured sapphire/alumina, and even DNA and other organic
polymeric materials.
The positional diamond mechanosynthesis tool
consists of two distinct parts which are covalently joined.
The first part of the positional diamond mechanosynthesis
tool is the tooltip molecule (Figure 2).
In the preferred embodiment the tooltip molecule consists of one
or more adamantane molecules arranged in a polymantane or lonsdaleite
(iceane; Figure 2C) configuration making
a triadamantane base molecule. One or more dimerholder atoms (most
preferably the Group IV elements Si, Ge, Sn, and Pb with three bonds
into the base, but Group V elements N, P, As, Sb and Bi and Group
III elements B, Al, Ga, In, and Tl with two bonds into the base
may also be used [36]) are substituted into each
of the adamantane molecules composing the triadamantane base molecule.
A single carbon dimer (C2) molecule is bonded to two dimerholder
atoms integral to the triadamantane base molecule; the carbon dimer
is held by the tooltip but is later mechanically released during
a mechanosynthetic dimer placement operation. Finally, a capping
group is temporarily bonded to the two dangling bonds of the carbon
dimer, passivating the dangling bonds and chemically stabilizing
the tooltip molecule for a solution-phase environment. The capping
group must be removed from the tooltip, exposing the dimer dangling
bonds and activating the tooltip molecule, prior to use in a diamond
mechanosynthesis operation.
The second part of the positional diamond mechanosynthesis
tool is the handle structure (e.g., Figure 17).
The handle structure may be a large rigid molecule, consisting in
the preferred embodiment of a regular crystal, or a rod, or a cone,
of pure hydrogen-terminated diamond, thus providing the greatest
possible mechanical rigidity and thermal stability. At the base
of the handle, the handle structure is sufficiently wide (0.1-10
microns in diameter) to be securely grasped by, or bonded to, a
conventional SPM tip, a MEMS robotic end-effector, or other similarly
rigid and well-controlled microscale manipulator device. Near the
apex of the handle structure, the tooltip molecule is covalently
bonded to the handle structure, forming an intimate and permanent
connection thereto. The tooltip molecule is oriented coaxially with
the handle structure, with the carbon dimer (whether capped or uncapped)
of the tooltip molecule occupying the location most distal from
the base of the handle structure, just as the writing tip of a sharpened
pencil is most distal from the pencil eraser end.
The manufacture of the complete positional diamond
mechanosynthesis tool requires four distinct steps, including (1)
synthesis of capped tooltip molecule (Section 2.1),
(2) attachment of tooltip molecule to deposition surface in a preferred
orientation (Section 2.2), (3) attaching handle
structures onto the tooltip molecules (Section 2.3),
and finally (4) separating the finished tools from the deposition
surface (Section 2.4). The concept of seeded
growth of a useful nanoscale tool has previously been employed in
the CVD growth of carbon nanotube tips for AFM [50-52].
2.1 STEP 1: Synthesis of
Capped Tooltip Molecule
STEP 1. Synthesize
the triadamantane tooltip molecule, with its active C2 dimer tip
appropriately capped, using methods of bulk chemical synthesis
derived from known synthesis pathways for functionalized polyadamantanes
as found in the existing chemical literature.
While an explicit synthesis of the exact DCB6-X
(X = Si, Ge, Sn, Pb) capped tooltip molecule has not yet been located
in the chemical literature, the sila-adamantanes have been investigated
since at least the early 1970s [53-55]
and multiply-substituted adamantanes such as 1,3,5,7-tetramethyl-tetrasilaadamantane
[53, 56] and other 1,3,5,7-tetrasilaadamantanes
[57] have been synthesized. Adamantanes are readily
functionalized with alkene C=C bonds, e.g., 2,2-divinyladamantane,
a colorless liquid at room temperature [161].
Polymantanes as a class of molecules can be functionalized [58,
60] and assembled to a limited extent, including
biadamantanes [63], diadamantanes [64-66]
and diamantanes [67], triamantanes [68,
69], and tetramantanes [70,
71]. The Beilstein database lists over 20,000
adamantane variants and there are several excellent literature reviews
of adamantane chemistry [59-63].
The molecular geometries of diamantane, triamantane, and isotetramantane
have been investigated theoretically using molecular mechanics,
semiempirical and ab initio approaches [72].
The core of the DCB6-X (X = Si, Ge, Sn, Pb) class of adamantane-based
tooltip molecules is a single iceane molecule (Figure
2C), the smallest unit cage of lonsdaleite or hexagonal diamond
(the counterpart to adamantane which is the unit cage for the more
common cubic diamond lattice). The iceane molecule was first synthesized
experimentally in 1974 [73-75]
and more recently has been studied using the customary methods of
computational chemistry [77-80];
commercial sources for hexagonal diamond (lonsdaleite) powder already
exist [76].
A crucial decision to be made in a particular
application of this invention is the choice of capping group to
be used to passivate the two dangling bonds of the C2 dimer that
is held by the tooltip molecule. The presence of the capping group
converts the otherwise highly reactive C2 dimer radical into a chemically
stable moiety in solution phase for the duration of the synthesis
process. Only when the capping group is later removed (Section
2.2), in vacuo, does the C2 dimer resume its status as a chemically
active radical. Note that for some choices of capping group it may
be simpler to synthesize the capped tooltip molecule in the configuration
of a double-capped single-bonded C-C dimer, then employ a subsequent
process to alkenate the dimer bond to C=C which would include removing
half of the capping groups.
Many possible capping groups could in principle
provide electronic closed-shell termination of the C2 dangling bonds,
thus maximizing tooltip molecule chemical stability during conventional
solution synthesis in Step 1 and during tooltip
molecule attachment in Step 2 (Section
2.2). In some procedures, attachment is facilitated if the chemical
structure of the capping group is highly dissimilar to the adamantane
structure of the tooltip molecule, so that the capping group may
be conveniently removed, e.g., by selective bond resonance excitation,
during the tooltip attachment process. (Thus purely hydrocarbon-based
and some other organic radicals may be problematic as capping groups.)
For simplicity of analysis, ease of tooltip molecule synthesis,
and ease of capping group removal, the capping group should have
as few atoms as possible, all else equal. An enumeration of 400
potentially useful capping groups fulfilling the above requirements
is given in Table 1, though the present invention
is not limited to this partial list of illustrative exemplar moieties.
As the number of atoms in the capping group increases, the combinatoric
possibilities expand enormously. Some of the groups listed in Table
1 may yield tooltip molecules that are stable only at very low
temperatures or only in particular chemical environments, and a
few may not yet have been verified as experimentally available or
even chemically stable.
Table 1. Possible capping
groups for the C2 dimer tooltip molecule |
|
Type of Capping Group |
Capping Group Atoms or Multi-atom Moieties |
Single-atom, single-element (=C-cap) |
-H, -F, -Cl, -Br, -I
-Li, -Na, -K, -Rb, -Cs
|
Bridge-atoms, single-element (=C-cap-C=)
|
-O-, -O-O-, -S-, -S-S-, -Se-, -Se-Se-, -Te-, -Te-Te-
-Be-, -Be-Be-, -Mg-, -Mg-Mg-, -Ca-, -Ca-Ca-, -Sr-, -Sr-Sr-,
-Ba-, -Ba-Ba-
|
Two-atom, two-element (=C-cap)
|
-OH -OF -OCl -OBr -OI -OLi -ONa -OK -ORb -OCs |
-SH -SF -SC -SBr -SI -SLi -SNa -SK -SRb -SCs |
-SeH -SeF -SeCl -SeBr -SeI -SeLi -SeNa -SeK -SeRb -SeCs
|
-TeH -TeF -TeCl -TeBr -TeI -TeLi -TeNa -TeK -TeRb -TeCs |
-BeH -BeF -BeCl -BeBr -BeI |
-MgH -MgF -MgCl -MgBr -MgI |
-CaH -CaF -CaCl -CaBr -CaI |
-SrH -SrF -SrCl -SrBr -SrI |
-BaH -BaF -BaCl -BaBr -BaI |
|
Bridge-atoms, two-element (=C-cap-C=)
|
-NH-, -NHHN-, -PH-, -PHHP-, -AsH-, -AsHHAs-, -SbH-,-SbHHSb-,
-BiH-, -BiHHBi-, -BH-, -BHHB-, -AlH-, -AlHHAl-,-GaH-, -GaHHGa-,
-InH-, -InHHIn-, -TlH-, -TlHHTl-
-NLi-, -NLiLiN-, -PLi-, -PLiLiP-, -AsLi-, -AsLiLiAs-, -SbLi-,-SbLiLiSb-,
-BiLi-, -BiLiLiBi-, -BLi-, -BLiLiB-, -AlLi-, -AlLiLiAl-,-GaLi-,
-GaLiLiGa-, -InLi-, -InLiLiIn-, -TlLi-, -TlLiLiTl-
-NF-, -NFFN-, -PF-, -PFFP-, -AsF-, -AsFFAs-, -SbF-,-SbFFSb-,
-BiF-, -BiFFBi-, -BF-, -BFFB-, -AlF-, -AlFFAl-,-GaF-, -GaFFGa-,
-InF-, -InFFIn-, -TlF-, -TlFFTl-
-NNa-, -NNaNaN-, -PNa-, -PNaNaP-, -AsNa-, -AsNaNaAs-, -SbNa-,-SbNaNaSb-,
-BiNa-, -BiNaNaBi-, -BNa-, -BNaNaB-, -AlNa-, -AlNaNaAl-,-GaNa-,
-GaNaNaGa-, -InNa-, -InNaNaIn-, -TlNa-, -TlNaNaTl-
-NCl-, -NClClN-, -PCl-, -PClClP-, -AsCl-, -AsClClAs-, -SbCl-,-SbClClSb-,
-BiCl-, -BiClClBi-, -BCl-, -BClClB-, -AlCl-, -AlClClAl-,-GaCl-,
-GaClClGa-, -InCl-, -InClClIn-, -TlCl-, -TlClClTl-
-NK-, -NKKN-, -PK-, -PKKP-, -AsK-, -AsKKAs-, -SbK-,-SbKKSb-,
-BiK-, -BiKKBi-, -BK-, -BKKB-, -AlK-, -AlKKAl-,-GaK-, -GaKKGa-,
-InK-, -InKKIn-, -TlK-, -TlKKTl-
-NBr-, -NBrBrN-, -PBr-, -PBrBrP-, -AsBr-, -AsBrBrAs-, -SbBr-,-SbBrBrSb-,
-BiBr-, -BiBrBrBi-, -BBr-, -BBrBrB-, -AlBr-, -AlBrBrAl-,-GaBr-,
-GaBrBrGa-, -InBr-, -InBrBrIn-, -TlBr-, -TlBrBrTl-
-NRb-, -NRbRbN-, -PRb-, -PRbRbP-, -AsRb-, -AsRbRbAs-, -SbRb-,-SbRbRbSb-,
-BiRb-, -BiRbRbBi-, -BRb-, -BRbRbB-, -AlRb-, -AlRbRbAl-,-GaRb-,
-GaRbRbGa-, -InRb-, -InRbRbIn-, -TlRb-, -TlRbRbTl-
-NI-, -NIIN-, -PI-, -PIIP-, -AsI-, -AsIIAs-, -SbI-,-SbIISb-,
-BiI-, -BiIIBi-, -BI-, -BIIB-, -AlI-, -AlIIAl-,-GaI-, -GaIIGa-,
-InI-, -InIIIn-, -TlI-, -TlIITl-
-NCs-, -NCsCsN-, -PCs-, -PCsCsP-, -AsCs-, -AsCsCsAs-, -SbCs-,-SbCsCsSb-,
-BiCs-, -BiCsCsBi-, -BCs-, -BCsCsB-, -AlCs-, -AlCsCsAl-,-GaCs-,
-GaCsCsGa-, -InCs-, -InCsCsIn-, -TlCs-, -TlCsCsTl-
|
Three-atom, two-element (=C-cap) |
-NH2 -PH2 -AsH2 -SbH2 -BiH2 -NLi2 -PLi2 -AsLi2 -SbLi2
-BiLi2
-BH2 -AlH2 -GaH2 -InH2 -TlH2 -BLi2 -AlLi2 -GaLi2 -InLi2
-TlLi2
|
-NF2 -PF2 -AsF2 -SbF2 -BiF2 -NNa2 -PNa2 -AsNa2 -SbNa2
-BiNa2
-BF2 -AlF2 -GaF2 -InF2 -TlF2 -BNa2 -AlNa2 -GaNa2 -InNa2
-TlNa2
|
-NCl2 -PCl2 -AsCl2 -SbCl2 -BiCl2 -NK2 -PK2 -AsK2 -SbK2
-BiK2
-BCl2 -AlCl2 -GaCl2 -InCl2 -TlCl2 -BK2 -AlK2 -GaK2
-InK2 -TlK2
|
-NBr2 -PBr2 -AsBr2 -SbBr2 -BiBr2 -NRb2 -PRb2 -AsRb2
-SbRb2 -BiRb2
-BBr2 -AlBr2 -GaBr2 -InBr2 -TlBr2 -BRb2 -AlRb2 -GaRb2
-InRb2 -TlRb2
|
-NI2 -PI2 -AsI2 -SbI2 -BiI2 -NCs2 -PCs2 -AsCs2 -SbCs2
-BiCs2
-BI2 -AlI2 -GaI2 -InI2 -TlI2 -BCs2 -AlCs2 -GaCs2 -InCs2
-TlCs2
|
|
Organic radicals (=C-cap)
|
methyl (-CH3), vinyl (-CH=CH2), ethyl (-CH2CH3),
etc. carboxyl (-COOH), methoxy (-OCH3), etc. formyl (-CHO),
acetyl (-CCH3O), etc. phenyl (-C6H5) etc. |
The precise choice of capping group is determined
by the desired interactions of tooltip molecules with the selected
deposition surface (as described in Step 2
(Section 2.2) and Step 4
(Section 2.4)), but also by the desired interactions
of tooltip molecules with themselves, e.g., during synthesis. There
are at least four relevant factors which must be considered.
First, from the standpoint of basic utility
the ideal capping group: (1) should be loosely bound to the dimer,
thus easily released in order to uncap (and activate) the tooltip;
(2) should form only a single bond with carbon; and (3) should be
very simple, hence relatively easy to synthesize in a polymantane
system. A few capping atoms that meet these criteria are given in
Table 2.
Table 2. Bonding energies between
capping group and carbon or diamond (modified from [4]) |
|
Possible Tooltip Molecule Capping Atoms |
Bond Energy to Carbon (kcal/mole)
|
Bond Energy to Diamond* (kcal/mole)
|
Iodine (I)
Sulfur (S)
Bromine (Br)
Silicon (Si)
Nitrogen (N)
Methoxy (OCH3)
Chlorine (Cl)
Carbon (C)
Oxygen (O)
Hydroxyl (OH)
Hydrogen (H)
Fluorine (F)
|
52
65
68
72
73
---
81
83
86
---
99
116
|
49.5
---
63
---
---
78
78.5
80
---
90.5
91
103
|
* Values given are the binding energies of tertiary carbon
atoms to the capping atoms, i.e., the bonding energy between
capping atoms and a carbon atom which is bound to three other
carbon atoms. |
For ease of release alone, Table
2 implies that a preferred embodiment is to use two iodine atoms
as the C2 dimer capping group of the tooltip molecule, as shown
in Figure 3 below, right, though other capping
groups may also serve in this capacity.
Figure 3. DCB6-Ge tooltip
molecule, uncapped (left), and capped (right) with iodine atoms
(A) uncapped
(B)) capped with iodine atoms
Second, during bulk chemical synthesis
using conventional techniques in solution phase, the capped tooltip
molecule should not spontaneously dimerize across the C2 working
tips. Dimerization can occur between two tooltip molecules across
one bond or two bonds, as shown in Figure 4.
Table 3 shows the results of geometry optimization
energy minimization calculations using semi-empirical AM1 for the
DCB6-Ge capped tooltip molecule [235] in various
stages of “tip-on-tip” dimerization, for a variety of
capping groups, in vacuo.
With no protective capping group in place, tip-to-tip
dimerization is very energetically favorable. Tooltip molecule dimerization
is energetically unfavorable to varying degrees for 1-atom capping
groups consisting of, for example, -I, -Cl, -F, -Na, and -Li, and
also for several 2-atom capping groups including hydroxyl (-OH),
amine (-NH2), oxylithyl (-OLi), oxyiodinyl (-OI), and sulfiodinyl
(-SI). In the case of some 2-atom oxyl (-OF), sulfyl (-SS-, -SH,
-SF), and selenyl (-SeH) capping groups, dimerization is energetically
unfavorable for direct =C-C= bonds linking the two tooltip molecules
but appears likely to occur if dimerization occurs through an oxygen,
sulfur (e.g., =C-S-C= or =C-S-S-C=) or selenium atom in the dimerization
bond(s) linking the two tooltip molecules. Single-bond dimerization
of an H-capped tooltip molecule with release of H2 is also energetically
favorable, though double-bond dimerization for H-capped tooltips
with the release of 2H2 appears unfavorable.
These analyses should be repeated using ab initio
techniques, and should be extended to include a calculation of activation
energy barriers (which could be substantial), weak ionic forces
that could lead to crystallization (in the case of capping groups
containing metal or semi-metal atoms), and solvent effects, all
of which could affect the results. As a limited example of one such
study, Mann et al [38] found that the dimerization
reaction enthalpies of uncapped DCB6-Si and DCB6-Ge tooltip molecules
are -1.64 eV and -1.84 eV, but that the energy barriers to the dimerization
reaction were 1.93 eV and 1.86 eV, respectively. Therefore the dimerization
of uncapped DCB6-Si and DCB6-Ge tooltip molecules “is thermodynamically
favored but not kinetically favored. Due to the electron correlation
errors in DFT these barrier heights may be considerably overestimated,
therefore both reactions may be kinetically accessible at room temperature.”
Subsequent work [235] appears to have confirmed
that both tooltips work well as expected on the diamond C(110) surface,
with the DCB6-Ge structure emerging as the preferred dimer placement
tooltip molecule [235].
Figure 4. Progressive
stages of possible “tip-on-tip” dimerization of capped
tooltip molecules
(A) undimerized
(B) dimerized (1-bond)
(C) dimerized (2-bond)
Table 3. Energy minimization
calculations for DCB6-Ge capped tooltip molecule “tip-on-tip”
dimerization, using semi-empirical AM1 (0 eV = lowest-energy
configuration) |
|
Tooltip Molecule Capping Group |
Undimerized Tooltip Molecule (eV)
|
Lowest-E Dimerized Tooltip Molecule
(1-bond) (eV) |
Lowest-E Dimerized Tooltip Molecule
(2-bond) (eV) |
Dioxyl (=C-O-O-C=) |
forms unstable cyclic peroxides (ozonides) |
Diberyl (=C-Be-Be-C=)
Be in dimerizing bond(s):
no Be in dimerizing bond(s):
Oxygen (=C-O-C=)
including ozonides:
excluding ozonides:
O in dimerizing bond(s):
no O in dimerizing bond(s):
Beryllium (=C-Be-C=)
Sulfur (=C-S-C=)
S in dimerizing bond(s):
no S in dimerizing bond(s):
Imide (=C-NH-C=)
Diselenyl (=C-Se-Se-C=)*
Se in dimerizing bond(s):
no Se in dimerizing bond(s):
Diamine (=C-NHHN-C=)
N in dimerizing bond(s):
no N in dimerizing bond(s):
Selenium (=C-Se-C=)*
Se in dimerizing bond(s):
no Se in dimerizing bond(s):
NO CAPPING GROUP
Nitrodiiodinyl (I2N-C=C-NI2)
N in dimerizing bond(s):
no N in dimerizing bond(s):
Disulfyl (=C-S-S-C=)
S in dimerizing bond(s):
no S in dimerizing bond(s):
Selenohydryl (H-Se-C=C-Se-H)*
Se in dimerizing bond(s):
no Se in dimerizing bond(s):
Magnesium (=C-Mg-C=)*
Mg in dimerizing bond(s):
no Mg in dimerizing bond(s):
Oxybromyl (Br-O-C=C-O-Br)
O in dimerizing bond(s):
no O in dimerizing bond(s):
Phosphohydryl (H2P-C=C-PH2)
P in dimerizing bond(s):
no P in dimerizing bond(s):
Oxyfluoryl (F-O-C=C-O-F)
O in dimerizing bond(s):
no O in dimerizing bond(s):
Dimagnesyl (=C-Mg-Mg-C=)*
Mg in dimerizing bond(s):
no Mg in dimerizing bond(s):
Nitrodifluoryl (F2N-C=C-NF2)
N in dimerizing bond(s):
no N in dimerizing bond(s):
Fluorosulfyl (F-S-C=C-S-F)
S in dimerizing bond(s):
no S in dimerizing bond(s):
Sulfobromyl (Br-S-C=C-S-Br)
S in dimerizing bond(s):
no S in dimerizing bond(s):
Hydrogen (H-C=C-H)
Bromine (Br-C=C-Br)
Sulfhydryl (H-S-C=C-S-H)
S in dimerizing bond(s):
no S in dimerizing bond(s):
Amine (H2N-C=C-NH2)
N in dimerizing bond(s):
no N in dimerizing bond(s):
Iodine (I-C=C-I)
Chlorine (Cl-C=C-Cl)
Sulfiodinyl (I-S-C=C-S-I)
S in dimerizing bond(s):
no S in dimerizing bond(s):
Borohydryl (H2B-C=C-BH2)
B in dimerizing bond(s):
no B in dimerizing bond(s):
Oxyiodinyl (I-O-C=C-O-I)
O in dimerizing bond(s):
no O in dimerizing bond(s):
Hydroxyl (H-O-C=C-O-H)
O in dimerizing bond(s):
no O in dimerizing bond(s):
Berylfluoryl (F-Be-C=C-Be-F)
Be in dimerizing bond(s):
no Be in dimerizing bond(s):
Seleniodinyl (I-Se-C=C-Se-I)*
Se in dimerizing bond(s):
no Se in dimerizing bond(s):
Berylchloryl (Cl-Be-C=C-Be-Cl)
Be in dimerizing bond(s):
no Be in dimerizing bond(s):
Oxylithyl (Li-O-C=C-O-Li)
O in dimerizing bond(s):
no O in dimerizing bond(s):
Selenobromyl (Br-Se-C=C-Se-Br)*
Se in dimerizing bond(s):
no Se in dimerizing bond(s):
Fluorine (F-C=C-F)
Sodium (Na-C=C-Na)**
Lithium (Li-C=C-Li)
|
+ 11.256
+ 11.256
+ 9.214
+ 9.214
+ 9.214
+ 9.214
+ 7.293
+ 7.089
+ 7.089
+ 7.015
+ 6.563
+ 6.563
+ 6.004
+ 6.004
+ 6.346
+ 6.346
+ 4.585
-
+ 3.702
+ 3.702
+ 3.545
+ 3.545
+ 3.320
+ 3.320
+ 2.886
+ 2.886
+ 2.271
+ 2.271
-
+ 1.322
+ 1.322
+ 1.242
+ 1.242
+ 1.206
+ 1.206
-
+ 1.160
+ 1.160
+ 0.648
+ 0.648
+ 0.425
+ 0.425
+ 0.379
+ 0.070
+ 0.075
+ 0.075
-
0
0
0
0
0
0
-
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
|
+ 5.013
+ 12.874
+ 7.520
+ 10.775
+ 7.520
----
+ 2.472
+ 2.843
----
+ 5.173
+ 2.141
+ 5.870
+ 1.438
+ 0.923
+ 3.565
----
----
-
+ 4.881
0
+ 0.612
+ 3.871
+ 1.545
+ 5.463
+ 1.544
----
0
+ 5.662
-
+ 1.398
0
+ 0.786
+ 2.479
----
+ 1.229
-
+ 0.642
+ 2.023
+ 0.593
+ 1.349
0
+ 0.426
0
0
+ 0.317
+ 0.856
-
+ 0.166
+ 0.969
+ 0.171
+ 0.236
+ 0.212
+ 0.525
-
+ 0.239
+ 0.270
+ 0.631
+ 2.705
+ 0.607
+ 2.839
+ 1.417
+ 1.092
+ 1.418
+ 7.294
+ 1.524
+ 1.633
+ 1.705
+ 4.539
+ 2.077
+ 4.826
+ 3.048
+ 3.753
+ 10.941
|
0
----
0
+ 0.492
0
+ 5.466
0
0
+ 6.661
0
+ 1.969
0
0
+ 6.315
0
+ 6.173
0
-
+ 3.594
+ 1.471
0
+ 4.799
0
+ 10.295
0
+ 2.012
+ 0.771
+ 10.001
-
+ 0.936
+ 1.926
0
+ 6.467
0
+ 3.204
-
0
+ 6.597
0
+ 5.509
+ 0.742
+ 5.733
+ 3.193
+ 3.426
0
+ 5.415
-
+ 0.512
+ 5.598
+ 3.621
+ 4.089
+ 0.166
+ 5.175
-
+ 0.926
+ 4.153
+ 0.467
+ 5.475
+ 0.576
+ 6.830
+ 2.680
+ 4.375
+ 7.364
+ 9.901
+ 2.625
+ 5.260
+ 3.803
+ 11.752
+ 6.670
+ 8.683
+ 9.682
+ 11.766
+ 23.698
|
* energy minimization computed using PM3 instead
of AM1 ** energy minimization computed using MNDO/d instead
of AM1 |
In the case of bromine, and to a lesser extent
in several other cases, the undimerized and 1-bond dimerized forms
appear energetically almost equivalent, although 2-bond dimerization
is energetically unlikely. Application of the process described
in Step 2 using a capping group having this
characteristic could result in a mixture of undimerized and 1-bond
dimerized tooltips attached to the deposition surface. In the event
that some 1-bond dimerizations occur and that a few dimerized tooltip
molecules are subsequently inserted into the deposition surface
during Step 2, the distinctive two-lobed geometric
signature of these dimerized nucleation seeds can be detected and
mapped via SPM scan prior to Step 3, and subsequently
avoided during tool detachment in Step 4. Surface
editing is another approach. Due to the low surface nucleation density
(Section 2.2.1), after the aforementioned mapping
procedure it may be possible to selectively detach and remove from
the surface all attached dimerized tooltip molecules that are detected,
e.g., using focused ion beam, electron beam, or NSOM photoionization,
subtractively editing the deposition surface prior to commencing
CVD in Step 3. An alternative to subtractive
editing is additive editing, wherein FIB deposition of new substrate
atoms on and around the dimerized tooltip molecule can effectively
bury it under a smooth mound of fresh substrate, again preventing
nucleation of diamond at that site during Step
3.
Third, the capped-C2 tip of the capped
tooltip molecule should not spontaneously recombine into the side
or the bottom of the adamantane base of neighboring tooltip molecules,
during synthesis or storage, as illustrated in Figure
5 for a side-bonding event. Recombination can occur between
two tooltip molecules across one bond or two bonds. Table
4 shows the results of semi-empirical energy calculations using
AM1 for the DCB6-Ge capped tooltip molecule in two particular cases
of “tip-on-base” side-bonding recombination, for a variety
of capping groups, in vacuo.
With no protective capping group, tip-on-base
recombination is very energetically preferred, with 1-bond recombination
preferred over 2-bond when the H atom released from the adamantane
base during formation of the 1-bond link becomes bonded with the
remaining dangling bond of the tip-held C2 dimer. Mann et al [38]
showed that intermolecular dehydrogenation from the bottom of the
adamantane base by a neighboring uncapped tooltip molecule is exothermic
and kinetically accessible (against a 0.48 eV reaction energy barrier)
at room temperature. However, with an appropriate cap in place,
tooltip molecule recombination is energetically unfavorable to varying
degrees, e.g., for 1-atom capping groups consisting of -I, -Br,
-Na, and -Li, and also for several 2-atom capping groups including
hydroxyl (-OH), amine (-NH2), oxylithyl (-OLi), seleniodinyl (-SeI),
several sulfyl groups including sulfhydryl (-SH), sulfiodinyl (-SI),
and sulfalithyl (-SLi), and dimagnesyl (-MgMg-). There may be some
tip-to-tip ionic bonding for beryllium (-Be-), lithium, oxylithyl,
seleniodinyl, selenobromyl (-SeBr), berylfluoryl (-BeF) and berylchloryl
(-BeCl) capping groups, and the imide (-NH-) cap appears to twist
the tooltip dimer out of horizontal alignment. In the case of some
2-atom sulfyl (-SF, -SBr), and selenyl (-SeH) capping groups, recombination
is energetically unfavorable for direct =C-C= bonds linking the
two tooltip molecules but appears likely to occur if recombination
occurs through a sulfur (e.g., =C-S-C= or =C-S-S-C=) or selenium
atom in the recombination bond(s) linking the two tooltip molecules.
Single-bond recombination of an H-capped tooltip molecule with release
of H2 is slightly energetically favorable, though double-bond dimerization
for H-capped tooltips with release of 2H2 appears very unfavorable
energetically. These analyses should be repeated using ab initio
techniques, and should be extended to include a calculation of activation
energy barriers (which could be substantial), weak ionic forces
that could lead to crystallization (in the case of capping groups
containing metal atoms), and solvent effects, all of which could
affect the results.
Figure 5. Progressive
stages of possible “tip-on-base” recombination of capped
tooltip molecules
(A) unrecombined
(B) 1-bond recombination
(C) 2-bond recombination
Table 4. Energy minimization
calculations for DCB6-Ge capped tooltip molecule “tip-on-base”
recombination with adamantane base of tooltip molecule,
using semi-empirical AM1 (0 eV = lowest-energy configuration) |
|
Tooltip Molecule Capping Group |
Unrecombined (eV)
|
Recombined (1 bond) (eV)
|
Recombined (2 bonds) (eV)
|
Oxyfluoryl (F-O-C=C-O-F)
O in recombining bond(s):
no O in recombining bond(s):
Oxygen (=C-O-C=)
Nitrodifluoryl (F2N-C=C-NF2)
N in recombining bond(s):
no N in recombining bond(s):
Beryllium (=C-Be-C=)
Diselenyl (=C-Se-Se-C=)*
Se in recombining bond(s):
no Se in recombining bond(s):
NO CAPPING GROUP
Diamine (=C-NHHN-C=)
N in recombining bond(s):
no N in recombining bond(s):
Sulfur (=C-S-C=)
Imide (=C-NH-C=)
Diberyl (=C-Be-Be-C=)
Be in recombining bond(s):
no Be in recombining bond(s):
Oxybromyl (Br-O-C=C-O-Br)
O in recombining bond(s):
no O in recombining bond(s):
Selenium (=C-Se-C=)*
Fluorosulfyl (F-S-C=C-S-F)
S in recombining bond(s):
no S in recombining bond(s):
Fluorine (F-C=C-F)
Selenohydryl (H-Se-C=C-Se-H)*
Se in recombining bond(s):
no Se in recombining bond(s):
Oxyiodinyl (I-O-C=C-O-I)
O in recombining bond(s):
no O in recombining bond(s):
Sulfobromyl (Br-S-C=C-S-Br)
S in recombining bond(s):
no S in recombining bond(s):
Magnesium (=C-Mg-C=)*
Borohydryl (H2B-C=C-BH2)
B in recombining bond(s):
no B in recombining bond(s):
Chlorine (Cl-C=C-Cl)
Nitrodiiodinyl (I2N-C=C-NI2)
N in recombining bond(s):
no N in recombining bond(s):
Hydrogen (H-C=C-H)
Hydroxyl (H-O-C=C-O-H)
O in recombining bond(s):
no O in recombining bond(s):
Bromine (Br-C=C-Br)
Phosphohydryl (H2P-C=C-PH2)
P in recombining bond(s):
no P in recombining bond(s):
Amine (H2N-C=C-NH2)
N in recombining side bond(s):
N in recombining bottom bond(s):
no N in recombining side bond(s):
no N in recombining bottom bond(s):
Dimagnesyl (=C-Mg-Mg-C=)*
Mg in recombining bond(s):
no Mg in recombining bond(s):
Iodine (I-C=C-I)
Sulfhydryl (H-S-C=C-S-H)
S in recombining bond(s):
no S in recombining bond(s):
Sulfiodinyl (I-S-C=C-S-I)
S in recombining bond(s):
no S in recombining bond(s):
Oxylithyl (Li-O-C=C-O-Li)
O in recombining bond(s):
no O in recombining bond(s):
Sodium (Na-C=C-Na)**
Berylfluoryl (F-Be-C=C-Be-F)
Be in recombining bond(s):
no Be in recombining bond(s):
Sulfalithyl (Li-S-C=C-S-Li)
S in recombining bond(s):
no S in recombining bond(s):
Berylchloryl (Cl-Be-C=C-Be-Cl)
Be in recombining bond(s):
no Be in recombining bond(s):
Lithium (Li-C=C-Li)
Selenobromyl (Br-Se-C=C-Se-Br)*
Se in recombining bond(s):
no Se in recombining bond(s):
Seleniodinyl (I-Se-C=C-Se-I)*
Se in recombining bond(s):
no Se in recombining bond(s):
|
+ 8.306
+ 8.306
+ 4.622
-
+ 4.228
+ 4.228
+ 3.544
+ 3.306
+ 3.306
+ 3.207
+ 3.118
+ 3.118
+ 3.106
+ 2.883
+ 2.147
+ 2.147
+ 2.027
+ 2.027
+ 1.788
+ 1.583
+ 1.583
+ 0.771
+ 0.668
+ 0.668
+ 0.353
+ 0.353
+ 0.351
+ 0.351
+ 0.258
-
+ 0.209
+ 0.209
+ 0.111
-
+ 0.068
+ 0.068
0
0
0
0
-
0
0
-
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
0
|
+ 4.557
+ 7.973
0
-
+ 2.779
+ 4.011
0
+ 2.765
+ 2.563
0
+ 0.014
+ 0.622
0
0
0
+ 0.154
+ 1.815
+ 2.004
0
+ 1.312
+ 2.365
0
+ 1.544
+ 4.596
+ 0.502
+ 0.257
+ 0.531
+ 0.879
0
-
+ 0.237
+ 1.073
0
-
+ 1.086
+ 1.469
+ 0.117
+ 1.304
+ 0.143
+ 0.276
-
+ 0.662
+ 0.399
-
+ 1.066
+ 1.043
+ 0.423
+ 0.744
+ 0.731
+ 1.294
+ 0.785
+ 0.799
+ 0.890
+ 0.833
+ 0.921
+ 2.218
+ 1.148
+ 1.225
+ 1.842
+ 1.635
+ 3.018
+ 2.032
+ 3.430
+ 2.057
+ 3.700
+ 5.340
+ 7.749
+ 8.123
+ 10.503
|
0
+ 10.788
+ 2.997
-
0
+ 6.015
+ 4.335
0
+ 6.508
+ 1.333
0
+ 3.238
+ 3.859
+ 2.729
+ 0.663
+ 3.393
0
+ 5.019
+ 3.680
0
+ 6.057
+ 2.620
0
+ 8.318
0
+ 3.334
0
+ 5.087
+ 3.352
-
0
+ 4.215
+ 3.121
-
0
+ 3.632
+ 2.679
+ 1.570
+ 3.235
+ 3.538
-
+ 0.615
+ 2.607
-
+ 0.992
+ 1.854
+ 3.025
+ 2.444
+ 1.196
+ 3.229
+ 4.256
+ 0.379
+ 4.701
+ 0.425
+ 5.383
+ 0.089
+ 4.156
+ 4.813
+ 2.665
+ 5.569
+ 0.973
+ 7.264
+ 5.542
+ 6.162
+ 7.444
+ 5.145
+ 10.775
+ 11.421
+ 14.970
|
* energy minimization computed using PM3 instead of AM1
** energy minimization computed using MNDO/d instead of AM1 |
In the case of chlorine, and to a lesser extent
in several other cases, the unrecombined and 1-bond recombined forms
appear energetically almost equivalent, although 2-bond recombination
is energetically unlikely. Application of the process described
in Step 2 using a capping group having this
characteristic could result in a mixture of unrecombined and 1-bond
recombined tooltips attached to the deposition surface. In the event
that some 1-bond recombinations occur and that a few recombined
tooltip molecules are subsequently inserted into the deposition
surface during Step 2, the distinctive two-lobed
geometric signature of these recombined nucleation seeds can be
detected and mapped via SPM scan prior to Step
3, and subsequently avoided during tool detachment in Step
4. Surface editing is another approach. Due to the low surface
nucleation density (Section 2.2.1), after the
aforementioned mapping procedure it may be possible to selectively
detach and remove from the surface all attached recombined tooltip
molecules that are detected, e.g., using focused ion beam, electron
beam, or NSOM photoionization, subtractively editing the deposition
surface prior to commencing CVD in Step 3.
An alternative to subtractive editing is additive editing, wherein
FIB deposition of new substrate atoms on and around the recombined
tooltip molecule can effectively bury it under a smooth mound of
fresh substrate, again preventing nucleation of diamond at that
site during Step 3.
Fourth, the capped-C2 tip of the capped
tooltip molecule should not spontaneously react with solvent, feedstock,
or catalyst molecules that are employed during conventional techniques
for the bulk chemical synthesis of functionalized adamantanes in
solution phase. A definitive result regarding this capping-group
selection factor depends critically upon the exact synthesis pathways
required.
As a proxy for these many pathways, it has been
shown that even straight-chain hydrocarbons, upon exposure to the
customary aluminum halide catalysts at high temperature, readily
produce mixtures of various polymethyladamantanes [81].
The simplest-case recombination event illustrated in Figure
6 was analyzed via semi-empirical energy calculations using
AM1 for the DCB6-Ge iodine-capped tooltip molecule in the specific
instances of 1-bond and 2-bond side-bonding recombination with a
simple straight-chain hydrocarbon molecule (n-octane). The 2-bond
analysis includes one event in which the second bond occurs adjacent
to the first, producing a 4-carbon ring with the octane molecule,
and a second alternative event in which the second bond occurs with
an octane chain carbon atom three positions down the chain, producing
a more stable 6-carbon ring with the octane molecule. Since solvent
effects, temperature, reverse reaction rates, and so forth will
determine whether the reaction can occur, and will also determine
the relative yields of various products and reactants, the thermodynamics
results indicate primarily the relative ease or difficulty of maintaining
the given capped tooltip molecule stably in solution with liquid
n-octane. The data in Table 5 show that iodine
(-I), hydrogen (-H), amine (-NH2), and perhaps bromine (-Br) capped
tooltip molecules should be the most stable in hydrocarbon media,
as should seleniodinyl (-SeI) and several sulfyl-capped molecules
including sulfhydryl (-SH), sulfiodinyl (-SI), and sulfobromyl (-SBr).
Fluorine- and oxygen-containing capping groups may be (relatively)
less stable.
Figure 6. Progressive stages of possible
side-bonding recombination reaction between an iodine-capped DCB6-Ge
tooltip molecule (above) and a molecule of n-octane (below)
|
->
|
|
(A) unrecombined |
|
(B) 1-bond recombination |
->
|
|
|
|
(C) 2-bond recombination (4-carbon ring) |
(D) 2-bond recombination (6-carbon ring)
|
Table 5. Energy minimization
calculations for DCB6-Ge capped tooltip molecule side-bonding
recombination reaction with a molecule of n-octane, using
semi-empirical AM1 (0 eV = lowest-energy configuration) |
|
Tooltip Molecule Capping Group |
Not Recombined (eV)
|
Recombined (1 bond) (eV) |
Recombined (2 bonds, 4-carbon ring) (eV)
|
Recombined (2 bonds, 4-carbon ring) (eV) |
Imide (-NH-)
Sulfur (=C-S-C=)
NO CAP
Diamine (-NHHN-)
Fluorine (-F)
Lithium (-Li)
Oxylithyl (-OLi)
Selenobromyl (-SeBr)*
Oxybromyl (OBr)
Oxyiodinyl (-OI)
Hydroxyl (-OH)
Nitrodifluoryl (-NF2)
Disulfyl (=C-S-S-C=)
Chlorine (-Cl)
Borohydryl (-BH2)
Sulfalithyl (-SLi)
Bromine (-Br)
Hydrogen (-H)
Phosphohydryl (-PH2)
Iodine (-I)
Amine (-NH2)
Nitrodiiodinyl (-NI2)
Sulfhydryl (-SH)
Sulfiodinyl (-SI)
Sulfobromyl (-SBr)
Berylfluoryl (-BeF)
Berylchloryl (-BeCl)
Dimagnesyl (-Mg2-)*
Seleniodinyl (-SeI)*
|
+ 4.075
+ 3.397
+ 3.347
+ 2.838
+ 1.989
+ 1.744
+ 1.194
+ 1.099
+ 0.979
+ 0.967
+ 0.948 - + 0.885
+ 0.841
+ 0.765 - + 0.690
+ 0.484
+ 0.346
+ 0.081 - + 0.043
0 - 0 - 0
0
0
0
0
0 - 0
0
|
0
0
----
+ 2.949
+ 1.029
+ 2.439
+ 1.189
+ 1.612
+ 0.503
+ 0.575
+ 0.472 - + 0.421
0
+ 0.429 - + 1.370
+ 1.276
+ 0.214
+ 0.069 - + 0.072
+ 0.147 - + 0.148 - + 0.239
+ 0.465
+ 0.478
+ 0.526
+ 0.562
+ 0.725 - + 0.956
+ 1.474
|
+ 2.148
+ 2.391
+ 1.935
+ 1.939
+ 1.999
+ 1.806
+ 2.379
+ 2.465
+ 1.963
+ 1.968
+ 1.987 - +1.961
+ 2.137
+ 2.044 - + 4.003
+ 1.859
+ 1.946
+ 1.939 - + 1.906
+ 2.041 - + 2.263 - + 2.261
+ 2.346
+ 2.579
+ 1.678
+ 2.263
+ 3.114 - + 2.399
+ 0.834
|
+ 0.200
+ 0.446
0
0
0
0
0
0
0
0
0 - 0
+ 0.380
0 - 0
0
0
0 - 0
+ 0.120 - + 0.301 - + 0.346
+ 0.759
+ 0.832
+ 1.082
+ 0.876
+ 1.191 - + 0.802
+ 1.498
|
* energy minimization computed using PM3 instead of AM1
|
2.2 STEP 2: Attach Tooltip
Molecule to Deposition Surface in Preferred Orientation
STEP 2. Attach
a small number of tooltip molecules to an appropriate deposition
surface in tip-down orientation, so that the tooltip-bound dimer
is bonded to the deposition surface.
The appropriate deposition surface material (Section
2.2.1) is determined by choosing a surface which is not readily
amenable to bulk diamond deposition, under the thermal and chemical
conditions that will prevail during the diamond deposition processes
described in Step 3. In Attachment Method A
(Section 2.2.2), tooltip molecules may be bonded
to the deposition surface in the desired orientation via low-energy
ion bombardment of the deposition surface in vacuo, creating a low
density of preferred diamond nucleation sites. In Attachment Method
B (Section 2.2.3), tooltip molecules may be
bonded to the deposition surface in the desired orientation by non-impact
dispersal and weak physisorption on the deposition surface, followed
by tooltip molecule decapping via targeted energy input producing
dangling bonds at the C2 dimer which can then bond into the deposition
surface in vacuo, also creating a low density of preferred diamond
nucleation sites. In Attachment Method C (Section
2.2.4), the techniques of conventional solution-phase chemical
synthesis are used to attach tooltip molecules to a deposition surface
in the preferred orientation, again creating diamond nucleation
sites.
2.2.1 Surface Nucleation and Choice of Deposition
Substrate
The intention of this invention is to grow a
handle molecule as a single crystal of bulk diamond large enough
to permit convenient physical manipulation of the attached C2 dimer-bearing
tooltip. Since this single crystal will be in the size range of
0.1-10 microns, and since sufficient room must be allowed around
each single crystal to afford access to a MEMS-scale gripping mechanism,
the maximum surface nucleation density appropriate for this process
in the preferred embodiment will be ~105 cm-2, giving a mean separation
between handle molecule crystals of ~32 microns on the deposition
surface. In other embodiments in which much smaller 100 nm handle
molecule crystals can be employed with narrower attachment clearances
for the external gripping mechanism, the maximum surface nucleation
density could be as high as ~109 cm-2, giving a mean separation
between surface-grown handle molecule crystals of ~320 nm.
Conventional diamond films grown by CVD on smooth
nondiamond substrates are characterized by very low nucleation densities,
typically <104 cm-2 when diamond is deposited on a polished silicon
wafer surface, which is many orders of magnitude less than that
exhibited by most materials [127]. (Interestingly,
the CVD nucleation density of diamond nanocrystals on an SiO2 substrate
is 6 orders of magnitude smaller than on pure silicon [18].)
The commercial preparation of continuous diamond films requires
separately nucleated diamond crystals eventually to grow together
to form a single sheet, hence is maximally efficient under conditions
of high nucleation density. Therefore diamond film growth procedures
often include preliminary substrate preparation techniques which
attempt to increase the nucleation density to a practicable level.
Such techniques typically involve introduction of surface discontinuities
by scratching or abrading the substrate surface with a fine diamond
grit powder or paste. Such surface discontinuities either create
preferential geometrical sites for diamond crystal nucleation, or
more probably embedded residues from the diamond abrading powder
may serve as nucleation sites from which diamond growth can occur
by accumulation. The presence of carbon particles on the surface
of a substrate can provide a high density of nucleation sites for
subsequent diamond growth [82]. As shown in Table
6, despite abrasive surface preparation the nucleation densities
for diamond films prepared by such techniques remain relatively
low, on the order of ~108 cm-2 (~1 'm-2) (vs. ~1015 cm-2 available
atomic sites), and the surface structure of such films is unpredictable
and typically exhibits very disordered surface patterns [127].
Nucleation has also been enhanced by coating substrate surfaces
with a thin (10-20 nm) layer of hydrocarbon oil [83].
Table 6. Typical surface nucleation
densities of diamond on polished silicon after various
surface pretreatments (modified from Liu and Dandy [84]) |
|
Pretreatment Method |
Typical Nucleation Density (nuclei/cm2)
|
No pretreatment
Covering/coating with Fe film
As+ ion implantation on Si
Covering/coating with graphite film
Manual scratching with diamond grit
Seeding
Ultrasonic scratching with diamond grit
Biasing (voltage)
Covering/coating with graphite fiber
C70 clusters + biasing 0
|
103 – 105
5 x 105
105 – 106
106
106 – 1010
106 – 1010
107 – 1011
108 – 1011
>109
3 x 1010
|
Since the purpose of this invention is to grow
isolated micron-scale diamond single crystals over tooltip molecule
nucleation sites, rather than a continuous diamond film, the deposition
surface ideally is chosen so as to minimize the number of natural
(non-tooltip molecule) nucleation sites. If tooltip molecules are
attached at a number density of ~105 cm-2 to a surface of polished
silicon otherwise having no pretreatment, the number density of
naturally occurring nucleation sites can be held to at most 103-105
cm-2. This implies that from 50% to 99% of the isolated micron-scale
diamond single crystals that are grown during Step
3 (Section 2.3) will be correctly nucleated
by surface-bound undimerized tooltip molecules. An SPM scan of the
deposition surface, following the completion of Step
2 but prior to the commencement of Step 3,
can identify and map the positions of all of the undimerized surface-bound
tooltip molecules, so that the isolated micron-scale diamond single
crystals that are later grown and properly nucleated by surface-bound
tooltip molecules can be identified prior to selection and detachment
in Step 4 (Section 2.4).
As noted by May [85], most
of the CVD diamond films reported to date have been grown on single-crystal
Si wafers, mainly due to the availability, low cost, and favorable
properties of Si wafers. But this is not the only possible substrate
material. Candidate substrates for diamond handle molecule crystal
growth must satisfy five important basic criteria [85],
the first four of which are summarized quantitatively in Table
7.
First, the substrate must have a melting
point (at the process pressure) higher than the temperature required
for diamond growth (at least 300-500 oC, but normally greater than
700 oC). This precludes the use of low-melting-point materials such
as plastics, aluminum, certain glasses and some electronic materials
such as GaAs as a deposition substrate, when hydrogenic diamond
CVD techniques are employed in Step 3 (Section
2.3).
Second, for growing diamond films the
substrate material should have a thermal expansion coefficient comparable
with that of diamond, since at the high growth temperatures currently
used, a substrate will tend to expand, and thus the diamond coating
will be grown upon and bonded directly to an expanded substrate.
Upon cooling, the substrate will contract back to its room temperature
size, whereas the diamond coating, with its very small expansion
coefficient, will be relatively unaffected by the temperature change,
causing the diamond film to experience significant compressive stresses
from the shrinking substrate, leading to bowing of the sample, and/or
cracking, flaking or even delamination of the entire film [85].
However, a nondiamond deposition surface for growing diamond tool
handle molecules, starting from surface-bound tooltip molecule nuclei,
should incorporate the maximum possible thermal expansion mismatch
between the substrate and diamond, producing thermal stresses upon
cooling that can facilitate tool separation from the nondiamond
deposition surface in Step 4 (Section
2.4).
Third, a mismatch in the crystal lattice
constant [86, 87] between
the diamond comprising the tool handle molecule and the nondiamond
substrate greatly reduces the bonding opportunities between handle
molecule and substrate, during handle molecule growth (Section
2.3). An extensive interfacial misfit also facilitates tool
separation from the nondiamond deposition surface in Step
4 (Section 2.4).
Fourth, in order to form adherent diamond
films it is a customary requirement that the substrate material
should be capable of forming a carbide layer to a certain extent,
since diamond CVD on nondiamond substrates usually involves the
formation of a thin carbide interfacial layer upon which the diamond
then grows. The carbide layer is viewed as a “glue”
which promotes diamond growth and aids its adhesion by (partial)
relief of interfacial stresses caused by lattice mismatch and substrate
contraction [85]. However, the ideal nondiamond
deposition surface for growing diamond tool handle molecules, starting
from surface-bound tooltip molecule nuclei, is a substrate that
resists or prohibits carbide formation. The absence of carbide on
the nondiamond deposition surface (a) discourages downgrowth of
the tool handle molecule into the substrate, (b) helps maintain
the isolation of the finished tooltip apex, and (c) facilitates
tool separation from the nondiamond deposition surface in Step
4 (Section 2.4). On the basis of carbide
exclusion, potential substrate materials including metals, alloys
and pure elements can be subdivided into three broad classes [85,
88], in descending order of preference for the
present invention:
(1) Carbide Exclusion.
Metals such as Cu, Sn, Pb, Ag and Au, as well as non-metals such
as Ge and sapphire/alumina (Al2O3), have little or no solubility
or reaction with C. These materials do not form a carbide layer,
and so any diamond layer that might try to form will not adhere
well to the surface (which is known as a way to make free-standing
diamond films, as the films will often readily delaminate after
deposition). These are the best materials for a deposition surface
upon which to grow detachable diamond tool handle molecules nucleated
by surface-bound tooltip molecules. Unwanted natural nucleation
centers are unlikely to arise on polished non-pretreated surfaces
and downgrowth from the tooltip molecule seed or the growing tool
handle structure, towards the substrate, will be resisted by these
surfaces.
(2) Carbon Solvation.
Metals such as Pt, Pd, Rh, Ni, Ti and Fe exhibit substantial mutual
solubility or reaction with C (all industrially important ferrous
materials such as iron and stainless steel cannot be diamond coated
using simple CVD methods) [85]. During CVD, a
substrate composed of these metals acts as a carbon sink whereupon
deposited carbon dissolves into the surface, forming a solid solution.
This dissolution transports large quantities of C into the bulk,
rather than remaining at the surface where it can promote diamond
nucleation [85]. Often diamond growth on the
surface only begins after the substrate is completely saturated
with carbon, with carbide finally appearing on the surface, by which
time the tool handle molecule may already have grown sufficiently
large as a single diamond crystal atop a surface-bound tooltip molecule.
(3) Carbide Formation.
Metals such as Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Co, Ni, Fe, Y,
Al, and certain other rare-earth metals can form carbide during
CVD. In some metals, such as Ti, the interfacial carbide layer continues
growing during diamond deposition and can become hundreds of microns
thick. Non-metals such as B and Si, and Si-containing compounds
such as SiO2, quartz and Si3N4, also form carbide layers, and substrates
composed of carbides themselves, such as SiC, WC and TiC, are particularly
amenable to diamond deposition [85]. Surface
nucleation rates (cm-2 hr-1) on stable carbide-forming substrates
(Si, Mo, W) are 10-100 times higher than on carbide-resistant substrates
[89], and surface nucleation density (cm-2) on
Mo is about 10 times higher than on other carbide-forming substrates
(Si, Ni, Ti, Al) under similar deposition conditions [90].
If used as polished non-pretreated deposition surfaces for diamond
tool handle growth, these materials should only sparsely produce
competing diamond crystal nucleation centers during hydrogenic CVD
processes. (Diamond cannot be epitaxially grown directly on silicon
or GaAs substrates [91].) However, carbon dimers
that are present in the feedstock gases during low-temperature nonhydrogenic
CVD can insert into Si and SiO2 surfaces, readily producing silicon
carbide [18]. Additionally, as the CVD process
continues, carbide-forming materials may permit some unwanted downgrowth
from the surface-bound tooltip molecule or growing tool handle structure,
towards the substrate. Note that bombardment of surfaces, particularly
refractory metal surfaces such as tungsten, with fullerene ions
having energies from about 0.0025-250 MeV results in implantation
of carbon and the formation of surface or subsurface carbides [11].
Table 7. Relevant physical
parameters of potential mechanosynthesis tool deposition
surface (substrate) material |
|
Substrate Material |
Melting Point at 1 atm (oC)
|
Linear Thermal ExpansionCoefficient (K-1)
|
Lattice Constant at ~300 K (')
|
Diamond (cubic) 0
Lonsdaleite (hexagonal)
a-axis
c-axis
Graphite (hexagonal)
a-axis
c-axis 0
|
3057 [92] 0
----
3797 [92]
|
0.8 x 10-6 [93, 94]
----
<0 [94]
25 x 10-6 [94]
|
3.566986 [95] 0
2.52 [94]
1.42 [94]
2.464 [95]
6.711 [95] 0
|
Carbide Exclusion:
Ge 0
Sn 0
Pb 0
Sapphire/Alumina (Al2O3):
normal to c-axis
parallel to c-axis
Au 0
Ag 0
Cu (fcc) 0
|
937 [96] 0
232 [96] 0
328 [96] 0
2045 [96] 0
1063 [96] 0
961 [96] 0
1084 [97] 0
|
6 x 10-6 [98]
22 x 10-6 [98]
28.9 x 10-6 [98]
5.0 x 10-6 [99]
6.66 x 10-6 [99]
14.2 x 10-6 [98]
18.9 x 10-6 [98]
17 x 10-6 [97]
|
5.64613 [100] 0
6.48920 [100] 0
4.95 [95] 0
4.76 [99] 0
13.00 [99] 0
4.08 [95] 0
4.09 [95] 0
3.61 [95] 0
|
Carbide Solvation:
Pt 0
Pd 0
Rh 0
|
1769 [96] 0
1552 [96] 0
1966 [96] 0
|
8.8 x 10-6 [98]
11.8 x 10-6 [98]
8.2 x 10-6 [98]
|
3.92 [95] 0
3.89 [95] 0
3.80 [95] 0
|
Carbide Formation:
Si (cubic) 0
SiO2 (quartz)
Si3N4
B (fcc)
Ti 0
Zr 0
Hf 0
V 0
Nb 0
Ta 0
Cr 0
Mo 0
W 0
Co (>390 oC) (fcc) 0
Ni (fcc) 0
Fe (<912 oC) (bcc) 0
Fe (912-1400 oC) (bcc) 0
Y 0
Y-ZrO2 (cubic)
Al
SiC (cubic) 0
WC (fcc) 0
TiC 0
|
1412 [97] 0
1710 [101] 0
1900 [96] 0
2300 [96] 0
1675 [96] 0
1852 [96] 0
2150 [96] 0
1890 [96] 0
2468 [96] 0
2996 [96] 0
1890 [96] 0
2610 [96] 0
3410 [96] 0
1494 [97] 0
1455 [97] 0
---- 0
1536 [97] 0
1495 [96] 0
2850 [102] 0
660 [96] 0
2697 [102] 0
2870 [96] 0
3140 [96] 0
|
7.6 x 10-6 [97]
13.3 x 10-6 [101]
3.3 x 10-6 [103]
6 x 10-6 [98]
8.6 x 10-6 [98]
5.7 x 10-6 [98]
5.9 x 10-6 [98]
8.4 x 10-6 [98]
7.3 x 10-6 [98]
6.3 x 10-6 [98]
4.9 x 10-6 [98]
4.8 x 10-6 [98]
4.5 x 10-6 [98]
12.5 x 10-6 [97]
13.3 x 10-6 [97]
12.1 x 10-6 [97]
>14.6 x 10-6 [97]
10.6 x 10-6 [98]
4.0 x 10-6 [102]
23.1 x 10-6 [98]
4.63 x 10-6 [102]
4-7 x 10-6 [104]
7 x 10-6 [104]
|
5.43095 [100] 0
4.91 (a), 5.41 (c) [101] 0
5.38 [105] 0
5.37 [106] 0
2.95 (a), 4.68 (c) [95] 0
3.23 (a), 5.15 (c) [95] 0
3.19 (a), 5.05 (c) [95] 0
3.03 [95] 0
3.30 [95] 0
3.30 [95] 0
2.51 (a), 4.07 (c) [95] 0
3.15 [95] 0
3.16 [95] 0
3.54 [97] 0
3.52 [97] 0
2.86 [97] 0
3.56 [97] 0
3.65 (a), 5.73 (c) [95] 0
5.07 [107] 0
4.05 [95] 0
4.3596 [91, 97] 0
4.248 [108] 0
~ 8.1 [109] 0
|
Easy Nucleation:
BN (cubic) 0
|
2727 [102] 0
|
0.59 x 10-6 [102]
|
3.615 [102] 0
|
Dimer Release Criterion. In addition to
these four basic factors, a fifth criterion in the choice of deposition
substrate material is that the tooltip molecule should bind the
C2 dimer more strongly than the deposition surface, so that when
the finished tool is pulled away from the deposition surface in
Step 4 (Section 2.4), the
dimer will stay attached to the tool and not remain on the deposition
surface. If the dimer stays with the tool, then the result is a
tool with an active tip ready to perform diamond mechanosynthesis.
If the dimer remains on the deposition surface, the result is a
dimerless “discharged” tool which must be recharged
with C2 dimer by some additional process [38]
before the tool can be used for diamond mechanosynthesis.
A full computational simulation of the interaction
between complete modeled deposition surfaces and the DCB6-Ge tooltip
has not yet been done. However, a preliminary evaluation has examined
the energy minima of a tooltip that is first joined to a deposition
surface through the dimer (EJ) and is then pulled away from the
deposition surface, for Dimer-on-Tooltip (EDoT) and Dimer-on-Surface
(EDoS) configurations, where the “surfaces” are crudely
modeled as follows: C (diamond), Si, Ge, Sn, and Pb surface as a
single nonterminated 10-atom adamantane-like cage, with the tooltip
dimer bonded to 2 adjacent cage atoms; Cu surface as 4 Cu atoms
arranged in a square, with the tooltip dimer bonded to 2 adjacent
Cu atoms; Al2O3 as a single 5-atom chain of alternating Al and O
atoms, with the tooltip dimer bonded to the two Al atoms; and C
(graphite) as a 3x3 (unit cells) flat single-plane sheet with all
perimeter C atoms immobilized. The quantity (EDoS – EDoT),
tabulated in the rightmost column of Table 8
for each surface, is negative if the dimer prefers to stick to the
surface after the tooltip has been pulled away from the surface,
and is positive if the dimer prefers to stick to the tooltip after
the tooltip has been pulled away from the surface, the desired result.
(This is only a crude analysis because the quantity (EDoS –
EDoT) really informs us only as to whether the total process of
charged tooltip deposition plus discharged tooltip retraction is
endo- or exothermic, not the reaction direction or preference.)
Since surfaces composed of the larger-radius Ag and Au atoms should
bind the dimer less strongly than Cu, it appears that all “carbide
exclusion” deposition surface materials listed in Table
7 (with the possible exception of Cu, whose (EDoS – EDoT)
is slightly negative; Table 8), and graphite,
at least tentatively satisfy this additional dimer-release criterion.
Note that a release energy (EJ – EDoT) < 0 for all deposition
surface in Table 8 suggests a thermodynamic
preference for a decapped tooltip molecule to bind to the deposition
surface.
Table 8. Crude estimate using
semi-empirical AM1 of energetic preference for tooltip
dimer to release from deposition surface, as the tooltip
is retracted from the deposition surface (values >0
for (EDoS – EDoT) indicate release from surface;
J = tooltip joined to surface through dimer, DoS = dimer
on surface, DoT = dimer on tooltip) |
|
Deposition Surface Material |
(EJ – EDoT) in
eV |
(EDoS – EDoT) in eV
|
C (diamond)
Si
Cu
Ge
Sn
Pb
Al2O3
C (graphite)
|
- 5.772
- 5.007
- 5.090
- 4.700
- 2.802
- 1.463
- 0.995
- 0.560
|
- 3.864
- 0.192
- 0.115
+ 1.067
+ 2.247
+ 2.743
+ 2.753
+ 5.180
|
Taking all five factors into account (Tables
7 and 8), “carbide
exclusion” materials are the optimal substrate for diamond
handle molecule crystal growth, and thus constitute the preferred
embodiment of this invention. Graphene sheets (e.g., graphite, carbon
nanotubes) may also be used with nonhydrogenic CVD processes, since
atomic hydrogen etches graphene, although there exists a preferential
epitaxial lattice registry relationship between the diamond C(111)
and graphite (0001) surfaces, and similarly between the diamond
C(110) and graphite (1120) surfaces [84], which
might encourage non-tooltip-molecule nucleation. Furthermore, any
conventional substrate material suitable for the deposition of CVD
diamond thereon may be employed as the substrate utilized in the
present invention, though perhaps with decreased efficiency or convenience.
Thus the substrate material could be a metal, a metal carbide, a
metal nitride, or a ceramic – e.g., silicon carbide, tungsten
carbide, molybdenum, boron, boron nitride, niobium, graphite, copper,
aluminum nitride, silver, iron, steel, nickel, silicon, alumina,
or silica [5], or combinations thereof including
cermets such as Al2O3-Fe, TiC-Ni, TiC-Co, TiC-TiN, or B4C-Fe systems
[110]. Finally, specialized surface treatments
may be applied to the deposition surface in order to suppress natural
nucleation – for example, ion implantation of Ar+ ions (3
x 1015 ions/cm2 at 100 KeV) on silicon substrate is known to decrease
nucleation density [111].
2.2.2 Tooltip Attachment Method A: Ion Bombardment
in Vacuo
Tooltip molecules may be bonded to the deposition
surface in the desired orientation via low-energy ion bombardment
of the deposition surface in vacuo, creating a low density of preferred
diamond nucleation sites. This is similar to the recognized pretreatment
method of (for example) As+ ion implantation (1014 ions/cm2 at 100
KeV) on silicon substrate [112, 113]
which yields a typical nucleation density of 105-106 nuclei/cm2,
up from 104 in the absence of such ion implantation treatment [84].
Ion-beam implantation of C+ ions to form diamond-like carbon (DLC)
films on various atomically clean substrates in chambers maintained
at <10-9 torr are well-known [114-118,
137], including gold [118]
and copper [119] surfaces, and halogen atoms
have been partially substituted for hydrogen in DLC deposited on
metal substrate in photosensor applications [120].
The specifics of Attachment Method A in the present
invention are as follows. First, capped tooltip molecules (Section
2.1) are supplied to an ionization source. A vapor of capped
tooltip molecules is created by heating in a vacuum chamber (e.g.,
C60 has a vapor pressure of 0.001 torr at 500 oC [17]).
The vaporized capped tooltip molecules are next ionized by at least
one of the procedures of laser ablation, electron bombardment, electron
attachment, or photoionization. The capped tooltip molecule ions
are then electrostatically accelerated to form a low-energy, highly
dilute tooltip molecule ion beam, a well-known technology [121].
The ion beam is then directed in a scanning pattern across the deposition
surface in vacuo. Upon striking the surface, the tooltip molecule
ions (Figure 7A) may partially fragment
with the release of the capping group, producing dangling bonds
at the C2 dimer which can then insert into the substrate surface
(Figure 7B). This beam energy transferred
to the tooltip molecule upon impact should not significantly exceed
7.802 eV, the minimum energy required to entirely remove the C2
dimer from an uncapped DCB6-Ge tooltip molecule [36].
(This is considerably lower than the 10-80 eV ions studied by Sinnott
et al [145] to functionalize carbon nanotubes
(CNTs) by similar means, the 10-300 eV C+ ion beams used to grow
diamond-like carbon films on various substrates [118],
and the >250 eV needed to fragment fullerene ions into free C2
dimer radicals [11].) Another outcome is that
only one capping group is released, bonding the tooltip molecule
to the surface with only one bond through the C2 dimer (Figure
7C). Table 9 shows that this 1-bond outcome
is energetically comparable to the 2-bond outcome, in the case an
iodine cap and a graphite surface. Yet another possible outcome
is that the tooltip molecule bonds to the surface at its base through
either one (Figure 7D) or two (Figure
7E) bonds, releasing an H or H2, respectively, though neither
base-bonding outcome is energetically preferred compared to the
desired dimer-bonding outcomes.
Figure 7. Schematic of iodine-capped
DCB6-Ge tooltip molecule (A) impacting 3x3 unit-cell graphite surface
in desired orientation, (B) bonding to surface and releasing capping
group as an I2 molecule, or alternatively, (C) bonding to surface
with only one bond through the C2 dimer with release of one I atom,
(D) one bond to surface through tooltip molecule base with release
of one H atom, or (E) two bonds to surface through tooltip molecule
base with release of one H2 molecule
Table 9. Energy minimization
calculations for iodine-capped DCB6-Ge tooltip molecule
bonding on 3x3 unit-cell single-plane graphite deposition
surface, using semi-empirical AM1 (0 eV = lowest-energy
configuration) and with all perimeter C atoms immobilized
in the flat graphite sheet |
|
(Tooltip + Surface) Configuration |
Illustrated in: |
Energy (eV)
|
Tooltip over surface (no bonding)
2 bonds to surface at C2 dimer + I2
1 bond to surface at C2 dimer + I
1 bond to surface at tooltip base + H
2 bonds to surface at tooltip base + H2
|
Figure 7A
Figure 7B
Figure 7C
Figure 7D
Figure 7E
|
0
+ 2.649
+ 2.056
+ 5.414
+ 4.382
|
Capping group removal energies from an isolated DCB6-Ge tooltip
molecule for a variety of capping groups are estimated computationally
(using semi-empirical AM1) as ranging from 1.9-7.4 eV (Table
10), as, for example, 3.554 eV for two iodine capping atoms,
4.728 eV for two amine capping groups, or 7.453 eV for two hydroxyl
capping groups. These required energies would be halved when only
one capping group is removed during tooltip molecule ion impact
with the surface.
Table 10. Capping group removal
energies for an isolated DCB6-Ge tooltip molecule, including
the caps for both carbon atoms in the C2 dimer, estimated
using semi-empirical AM1 |
|
Capping Group |
Removal Energy (eV) |
Capping Group |
Removal Energy (eV)
|
Magnesium (-Mg-)*
Phosphohydryl (-PH2 -PH2)
Seleniodinyl (-SeI -SeI)*
Dimagnesyl (-MgMg-)*
Beryllium (-Be-)
Sodium (-Na -Na)**
Selenobromyl (-SeBr -SeBr)*
Hydrogen (-H -H)
Bromine (-Br -Br)
Berylfluoryl (-BeF -BeF)
Iodine (-I -I)
Sulfobromyl (-SBr -SBr)
Selenohydryl (-SeH -SeH)*
Berylchloryl (-BeCl -BeCl)
Sulfochloryl (-SCl -SCl)
Chlorine (-Cl -Cl)
Borohydryl (-BH2 -BH2)
Diamine (-NHHN-)
Sulfur (-S-)
|
1.989
2.495
2.650
2.731
2.936
3.171
3.265
3.308
3.521
3.528
3.554
3.680
3.745
3.829
3.859
3.961
3.979
4.019
4.116
|
Sulfhydryl (-SH -SH)
Sulphiodinyl (-SI -SI)
Lithium (-Li -Li)
Fluorosulfyl (-SF -SF)
Nitrodiiodinyl (-NI2 -NI2)
Sulfalithyl (-SLi -SLi)
Amine (-NH2 -NH2)
Nitrodifluoryl (-NF2 -NF2)
Imide (-NH-)
Disulfyl (-SS-)
Oxygen (-O-)
Oxyfluoryl (-OF -OF)
Diberyl (-BeBe-)
Fluorine (-F -F)
Oxybromyl (-OBr -OBr)
Oxylithyl (-OLi -OLi)
Oxyiodinyl (-OI -OI)
Hydroxyl (-OH -OH)
|
4.141
4.231
4.323
4.374
4.624
4.702
4.728
4.896
5.012
5.058
5.339
5.474
5.761
6.782
7.063
7.104
7.215
7.453
|
* energy minimization computed using
PM3 instead of AM1 ** energy minimization computed using MNDO/d
instead of AM1 |
However, the removal energy for a single passivating
hydrogen atom in the base of the tooltip molecule is 3.519 eV for
an H atom removed from the bottom of the tooltip molecule base,
comparable to many of the capping group removal energies listed
in Table 10. Given the random orientation
of tooltip molecules upon their arrival at (and impact with) the
deposition surface, the sweep of a dilute beam of tooltip molecule
ions across the surface will result in a thin scattering of tooltip
molecules attached to the surface in a variety of orientations–some
bound by two bonds to the uncapped dimer (as desired), others bound
by only one bond to a partially uncapped dimer, and others bound
directly to the tooltip molecule base in various orientations. Simple
inspection of potential impact geometries suggests that energy transfer
primarily into the dimer capping group upon impact is most probable
if the tooltip molecule arrives at the deposition surface within
(conservatively) '20o of vertical, in tip-down orientation.
Therefore the probability of such arrival (assuming a random distribution
of tooltip molecule ion orientations in the beam) and hence the
probability of a dimer-bonded tooltip molecule (having either 1
or 2 bonds to the surface through the C2 dimer) is roughly
(40o/360o)2 ~ 1%, among all tooltip molecules
that become bonded to the deposition surface.
Given a ~1% success rate, after the bombardment
process and prior to the commencement of Step 3
the surface should be scanned by SPM to find and record the positions
of those few tooltip molecules that are bound to the surface in
the desired orientation. Depending upon the number density achieved,
undesired tooltip molecule nucleation sites might simply be avoided
during tool detachment in Step 4. Surface editing
is another approach. Due to the low surface nucleation density (Section
2.2.1), after the aforementioned mapping procedure it may be
possible to selectively detach and remove from the surface all attached
misoriented tooltip molecules that are detected, e.g., using focused
ion beam, electron beam, or NSOM photoionization, subtractively
editing the deposition surface prior to commencing CVD in Step
3. A second alternative to subtractive editing is additive editing,
wherein FIB deposition of new substrate atoms on and around the
misoriented tooltip molecule can effectively bury it under a smooth
mound of fresh substrate, again preventing nucleation of diamond
at that site during Step 3. A third corrective
procedure is reparative editing, wherein the methods described in
Attachment Method B (Section 2.2.3) are employed
to fully uncap the only partially uncapped tooltip molecule which
has become bonded to the deposition surface (through only one carbon
atom of the C2 dimer) during the ion bombardment process
of Attachment Method A. The result of this editing is that in Step
3, diamond handle structures will grow only on properly-oriented
surface-bound tooltip molecules.
The ability of a chemisorbed (covalently bonded)
tooltip molecule to migrate across a deposition surface in vacuo
depends strongly upon the chemical structure of both tooltip molecule
and the deposition surface material, and temperature. For example,
spontaneous surface migration of gold atoms on gold surfaces is
well known, though this mobility is greatly reduced at low temperatures
and possibly also by alloying with silver or in combinations with
other carbide resistant substrate materials. On the other hand,
Larsson [122] estimates that during conventional
diamond CVD on diamond substrate the acetylide radical (C2H)
has an energy barrier to migration of 3.6 eV across a clean diamond
C(111) surface and the methyl radical (CH3) has an even
higher energy barrier to migration of 3.7 eV; on C(100), estimates
for migration barriers range from 1.3-1.9 eV for methylene (CH2)
radicals [123, 124], 1.1-2.7
eV for methyl radicals [123, 125],
and 1.7 eV for ethylene (C=CH2) radicals [124].
Taking migration time from the Arrhenius equation as tmigrate-1
~ (kBT/h) exp(-Emig/kBT), where
h = 6.63 x 10-34 J-sec (Planck's constant) and kB
= 1.381 x 10-23 J/K (Boltzmann’s constant), then
at T = 300 K and Emig = 1.1-2.7 eV, tmigrate
~ 5 x 105 sec - 3 x 1032 sec on diamond substrate,
which is very slow. Tooltip molecules have ten times as many atoms
per molecule as the aforementioned radicals, hence should exhibit
much slower surface migrations at any given temperature.
2.2.3 Tooltip Attachment Method B: Surface
Decapping in Vacuo
Tooltip molecules may be bonded to the deposition
surface in the desired orientation by non-impact dispersal and weak
physisorption on the deposition surface, followed by tooltip molecule
decapping via targeted energy input producing dangling bonds at
the C2 dimer which can then bond into the deposition
surface in vacuo, again creating a low density of preferred diamond
nucleation sites (Figure 8).
Figure 8. Schematic of iodine-capped DCB6-Ge tooltip molecule
(A) dispersed on 3x3 unit-cell graphite surface in desired orientation,
(B) absorbing targeted energy sufficient to decap the tooltip molecule
in vacuo, releasing the capping group as two iodine ions or as an
I2 molecule, and (C) bonding to the deposition surface
The specifics of Attachment Method B in the present
invention are as follows.
First, capped tooltip molecules are dispersed
and physisorbed onto the deposition surface by any of several methods.
These methods may include (but is not limited to): (1) spin coating,
in which a suspension of capped tooltip molecules is applied to
the center of a spinning wafer of smooth deposition surface material,
and subsequently dispersed across the wafer surface; (2) dip
coating, in which a wafer of smooth deposition surface material
is dipped into a suspension of capped tooltip molecules and slowly
withdrawn; or (3) spray coating, in which a suspension of
capped tooltip molecules is applied to the wafer of smooth deposition
surface material as a fine spray. All three methods have been successfully
employed commercially to apply onto a smooth silicon wafer a dilute
coating of 100-200 nm diamond particles to a number density of ~1
'm-2 (~108 cm-2), starting with
a suspension of 1 gm diamond particles in 1 liter of isopropanol
[126-128], ethanol [82],
or methanol [129]. In another analogous application
[130], a layer of hydrocarbon molecules is applied
to a substrate by the Langmuir-Blodgett technique, whereupon the
surface is irradiated with a laser to decompose the layer of molecules
at the surface without influencing the substrate; after decomposition
the carbon atoms rearrange on the substrate surface to form a DLC
film.
It is well-known that simple adamantane (C10H16),
though having one of the highest melting points (542 K) of any hydrocarbon,
"sublimes readily at atmospheric pressure and room temperature."
[60] The enthalpy of sublimation for adamantane
is DHsubl = 58,810 J/mole (~0.61 eV/molecule) [131]
and the triple point for adamantane is Ttriple = 733
K at Ptriple = 2.7 GPa [132, 133],
hence from the Clausius-Clapeyron equation the partial pressure
of solid adamantane (Padam) may be estimated as: ln(Padam)
= ln(Ptriple) + (DHsubl / R) (Ttriple-1
- Tadam-1) = 31.37 – (7077 Tadam-1),
where R = 8.31 J/mole-K (universal gas constant). At Tadam
= 77 K (LN2 temperature), the partial pressure of adamantane
is only 5 x 10-32 atm, or ~1 sublimed adamantane molecule
per 200,000 m3 of volume at equilibrium, entirely negligible.
However, at 300 K, Padam = 0.024 atm, or ~1 sublimed
adamantane molecule per 1700 nm3 of volume at equilibrium,
a substantial sublimation rate.
The capped triadamantane tooltip molecule, being
a larger molecule and containing two or more heavy atoms, should
be less easily sublimed under ambient conditions. However, these
molecules have not yet been synthesized nor are their precise thermodynamic
properties known. Taking adamantane as the worst-case scenario,
the surface dispersal conditions most certain to work consist of
a suspension of capped tooltip molecules in a liquid nitrogen (LN2)
carrier fluid, dispersed onto a smooth deposition surface which
is maintained at or slightly below 77 K, the boiling point of LN2.
After applying the suspension to the deposition surface, the surface
temperature may be temporarily elevated to slightly above 77 K to
drive off the chemically inert LN2 carrier fluid, leaving
only capped tooltip molecules dispersed in vacuo on the cold deposition
substrate surface in the energetically preferred equilibrium position
shown in Figure 8A. If the selected capped
tooltip molecules have a low or negligible sublimation rate at room
temperature, then other higher-temperature suspension fluids may
be used which are easily evaporatable and compatible with the underlying
substrate, i.e., chemically nonreactive with the underlying substrate
material(s). For example, fullerenes including C60 and
C70 have been dispersed onto silicon, silica, and copper
surfaces at room temperature using an evaporatable carrier fluid
(e.g., toluene), then employed as growth nuclei for microwave plasma
diamond film CVD [82].
Second, the capping group must be induced
to debond from the C2 dimer in the tooltip molecule via
excitation of the =C-cap bond. Some crude methods will not work.
For example, if the capping atom is iodine, this atom has a large
mass and hence a low frequency of vibration in a C-I bond (e.g.,
~5.0 x 1012 Hz at 350 K), so the absorption of a single
IR photon of this frequency would add only ~0.02 eV to the bond,
which is insufficient to break it. From Table
10, ~1.777 eV is required to break each of the two C-I bonds
constituting the capping group of a DCB6-Ge tooltip molecule. This
energy corresponds to the absorption of a single 430 THz (~7000
') visible red photon. Laser photoexcitation, photodissociation
or photofragmentation [11] is commonly used in
atom-selective bond breaking to selectively control a chemical reaction,
e.g., the photodissociation of iodine atoms from iodopropane ions
[134]. The requisite bond-breaking energy can
be provided by a beam of electrons, noble element ions, or other
energetic neutrals [135-137]
directed towards the cooled deposition surface where the capped
tooltip molecules reside. Viewed from above in its preferred orientation
relative to the deposition surface, the iodine capped tooltip molecule
has a cross-sectional area of ~44.42 '2 of which ~5.05
'2 represents the cross-sectional area of the iodine
capping group, hence the beam of photons or ions carrying the debonding
energy will strike the capping group, on average, ~10% of the time
that they strike a tooltip molecule at all. Much more selectively,
an STM tip can be scanned over the cold deposition surface specifically
to break the C-I bond via ~1.5 eV single tunneling electrons [138-140].
For instance, the STM-mediated positionally-controlled single-molecule
dissociation of an iodine atom from individual molecules of copper
surface-physisorbed iodobenzene (C6H5I) and
diiodobenzene (C6H4I2) has been
demonstrated experimentally by Hla et al [140];
in the inelastic tunneling regime, lower-energy electrons can also
be injected via a resonance state between tip/substrate and the
target molecule, breaking the weak C-I bond in iodobenzene without
breaking the stronger C-C or C-H bonds [140].
Third, once the capping group has been
removed and the dangling bonds have been exposed from the C2
dimer, these bonds can form strong attachments with the deposition
substrate surface, thus affixing the tooltip molecule to the deposition
surface in the desired tip-down orientation. The energetics of the
bond-by-bond decapping procedure for an iodine-capped DCB6-Ge tooltip
molecule on a 3x3 unit-cell graphite surface is estimated in Figure
9 using semi-empirical AM1 simulations which included four unattached
atoms (2H, 2I) to permit total atom count to remain constant throughout
all substitutions. After each iodine capping atom is removed, the
conversion of the dangling C2 dimer bond to a new covalent
bond between dimer and deposition surface appears to be energetically
favored by 1.574 eV for the first bond and by 1.284 eV for the second
bond. However, the presence of stray H or I ions can poison this
reaction. For example, the dangling dimer bonds will bond to any
H ions that are present, in preference to bonding with the deposition
surface, so hydrogen must be excluded from the vicinity of the tooltip
molecules during this stage of the process. It would be helpful
to include a hydrogen getter in the vacuum chamber to absorb any
hydrogens that become separated from the tooltip base. Stray iodine
ions have a similar effect so it is helpful to include an intermittent
positive-voltage getter plate inside the chamber to periodically
attract and collect negative iodine ions as they are released from
the tooltip caps. However, if the number of purposely decapped iodine
atoms or accidentally debonded hydrogen atoms is on the order of
~105 cm-2 (Section 2.2.1
and Table 6) in a relatively large vacuum
chamber, then an encounter between such stray atoms and a surface-bound
tooltip molecule, even in the absence of any countermeasures, should
be an exceedingly rare event.
Figure 9. Estimated energetics of the
iodine-capped DCB6-Ge tooltip molecule decapping process on 3x3
unit-cell graphite surface, using semi-empirical AM1
The process of energy transfer to the tooltip
molecule for the purpose of releasing the capping iodine atoms might
also accidentally debond a hydrogen atom from the adamantane base
of the tooltip molecule. The energetics of this dehydrogenation
during various phases of the bond-by-bond decapping procedure for
an iodine-capped DCB6-Ge tooltip molecule on a 3x3 unit-cell graphite
surface is estimated in Figures 10, 11,
and 12 using semi-empirical AM1 and including
four unattached atoms (2H, 2I) to permit atom count to remain constant
during all substitutions.
In the case of a tooltip molecule having no bonds
to the surface through the C2 dimer (Figure
10), that loses one hydrogen atom in the side position of the
base, the tooltip molecule has a large energy barrier of 1.319 eV
against bonding to the deposition surface through the dangling bond.
Unless a stray H or I atom impinges at high velocity and recombines,
the dehydrogenated tooltip molecule will remain on the deposition
surface in the unreacted state and can later be sublimated off the
deposition surface by gentle heating.
Figure 10. Estimated energetics of a
dehydrogenation of the base of the iodine-capped DCB6-Ge tooltip
molecule during the decapping process on 3x3 unit-cell graphite
surface, using semi-empirical AM1 (0 eV = lowest-energy configuration),
for a tooltip molecule having no bonds to the surface (at bottom
left)
In the case of a tooltip molecule having one
bond to the surface through the C2 dimer (Figure
11), that loses one hydrogen atom in the side position of the
base, the tooltip molecule has only a small energy barrier (0.063
eV) against bonding to the deposition surface through the dangling
bond, so this unwanted double bonding is likely to occur even at
LN2 temperatures and cannot later be reversed via gentle
heating. Since the barrier is of order ~kBT, the configuration
change will occur about equally in both directions, producing approximately
equal populations of 1-bonded and 2-bonded configurations of tooltip
molecules that have lost a single H atom in the side position of
the base. These unwanted configurations can be observed by SPM and
edited out as previously described. In the unlikely event that a
stray H atom impinges and recombines, before the new bond to the
deposition surface is established, the original hydrogenated tooltip
molecule will be restored.
Figure 11. Estimated energetics of a dehydrogenation of the
base of the iodine-capped DCB6-Ge tooltip molecule during the decapping
process on 3x3 unit-cell graphite surface, using semi-empirical
AM1, for a tooltip molecule with one bond to the surface (at bottom
left)
In the case of a tooltip molecule having two
bonds to the surface through the C2 dimer (Figure
12), that loses one hydrogen atom in the side position of the
base, the tooltip molecule has a strong energy preference (2.277
eV) to bond again to the deposition surface through the dangling
bond, making a total of 3 bonds to the surface, a configuration
that must be removed by post-process editing, or mapped and avoided.
As before, the unlikely prior recombination of a stray H atom restores
the original hydrogenated tooltip molecule, but impingement of a
stray H or I atom before dehydrogenating the base can partially
debond the properly 2-bonded tooltip molecule from the deposition
surface. While the activation energy barrier to this reaction may
be large, even preventative, the existence of such pathways emphasizes
the need to minimize the number of stray H and I atoms that are
present in the vacuum chamber during the tooltip molecule attachment
process.
Figure 12. Estimated energetics of a
dehydrogenation of the base of the iodine-capped DCB6-Ge tooltip
molecule during the decapping process on 3x3 unit-cell graphite
surface, using semi-empirical AM1, for a tooltip molecule with two
bonds to the surface (at left)
Once a tooltip molecule has established at least
one strong bond to the deposition surface, its surface mobility
should be extremely low (Section 2.2.2). However,
prior to such bonding these molecules are only physisorbed to the
surface. Isolated pairs of iodine-capped DCB6-Ge tooltip molecules
placed in tip-to-tip, tip-to-base, tip-to-side, and base-to-base
orientations show weak energy barriers (calculated using semi-empirical
AM1) between these configurations of only 0.05-0.09 eV (vs. 0.04
eV for (300 K) room temperature, 0.007 eV for (77 K) LN2 temperature),
with just a slight preference for the base-to-base orientation.
Tooltip molecules placed near each other and tooltip molecules placed
several molecule widths apart in the same orientation show almost
no energetic preference with separation distance, so tooltip molecules
should be distributed randomly across the cold deposition surface.
By varying the choices of tooltip molecule, capping group, deposition
surface materials, and deposition surface temperature, the speed
of tooltip molecule migration across the deposition surface can
be made almost arbitrarily slow.
The enthalpy of sublimation for molecular iodine
(I2) is DHsubl = 60,800 J/mole (~0.63 eV/molecule) and the vapor
pressure over the solid is 6060 Pa at 100 oC [141],
hence from the Clausius-Clapeyron equation the partial pressure
of solid iodine (Piodine) may be estimated as: ln(Piodine) ~ 28.32
– (7316 Tiodine-1). At Tiodine = 77 K (LN2 temperature), the
partial pressure of iodine is only 1 x 10-34 atm but at room temperature
(Tiodine = 300 K) the partial pressure Piodine = 0.0005 atm, hence
any stray iodine that remains physisorbed to the deposition surface
after the completion of the decapping procedure may be driven off
by gentle heating and sublimation.
2.2.4 Tooltip Attachment Method C: Solution
Chemistry
Tooltip molecules may be bonded to the deposition
surface in the preferred orientation using the techniques of conventional
solution-phase chemical synthesis, creating a low density of preferred
diamond nucleation sites (Figure 13).
The specifics of Attachment Method C in the present
invention are as follows.
First, the deposition surface is functionalized
with an appropriate functionalization group. For illustrative purposes,
Figure 13A shows a section of (10,0) single-walled
carbon nanotube (CNT) with a functional group “X” attached
at the para- isomer positions (1 and 4) in one of the 6-carbon rings
in the graphene surface. A capped tooltip is shown above this surface.
For this invention, the functionalized deposition surface could
be a flat graphene surface (i.e., graphite), or could be a functionalized
non-graphene surface such as silicon, germanium, gold, and so forth
(see Table 7). Graphite is attacked by strong
oxidizing agents (such as sulfuric + nitric acid, or by chromic
acid) [142], allowing the random surface functionalization
of graphene; also, the chemical functionalization of fullerenes
is well-studied [143-148].
Since site-specific functionalization may not be not strictly required
in all cases, e-beam irradiation of dilutely surface-dispersed moieties,
ion-beam implantation of functional-group ions, electrochemical
functionalization [149, 150],
or other related techniques could be employed in some cases to attach
functional groups on the deposition surface at very high dilution,
e.g., at 1 micron separations. However, direct chemical modification
of surfaces via SPM tip [39, 140]
enables the functionalization of the deposition surface at specific
atomic sites, in cases where this is necessary.
Figure 13. Attachment of tooltip molecule
to graphene deposition surface via solution phase combination of
capping group and surface functionalization group
Second, conventional techniques of chemical
synthesis are employed to establish conditions in solution phase
whereby the tooltip molecule capping group, illustrated in Figure
13A by iodine, combines with the deposition surface functionalization
group, here illustrated as "X", resulting in the removal
of both I and X, leaving the tooltip molecule chemically bound to
the deposition surface across two bonds at the carbon C2
dimer as shown in Figure 13B – much
like the standard esterification reaction wherein an alcohol molecule
having a terminal –OH group combines with a second organic
acid molecule having a terminal –H group, creating a C-C covalent
bond between the two molecules (an ester) with the release of an
H2O in the process. It is possible that a specific convenient
alkenation reaction can be found in the standard chemical synthesis
literature, perhaps as an analog to the synthesis pathways for bicyclooctene
(Figure 13C) or more directly as an analog
to methods that may already be known for the alkenation (ethenation)
of graphite, CNTs, or other deposition surfaces such as Si, Ge,
or Au. The attachment reaction could be enhanced in the case of
a nanotube deposition surface by using a kinked CNT, then anticipating
the tooltip to preferentially attach at the kink site where CNTs
are most reactive [151].
Density functional theory (DFT) analysis [152]
has considered cycloadditions of dipolar molecules to the C(100)-(2x1)
diamond surface. Experiments [153] have demonstrated
the [2+4] cycloaddition of benzyne (C6H4) to polycyclic aromatics
such as anthracene, forming triptycene (Figure
13D). DFT studies [154, 155]
of the possible cycloaddition reaction of ortho-benzyne molecules
to the graphene walls of carbon nanotubes have been done (Figures
13E and 13F).
There have also been experimental investigations of solution-phase
cycloaddition of organic molecules to semiconductor surfaces [156]
and studies of diamondlike carbon films grown in organic solution
[157] or grown via the electrolysis of acetates
in solution phase [158]. Hoke et al [159]
and others [160] have examined the reaction
path for ortho-benzyne with C60 and C70 that
leads to the [2+2] cycloaddition product in which benzyne adds across
one of the interpentagonal bonds, forming a cyclobutene ring.
Most directly on point as prior art, Giraud et
al [161-163] have synthesized
2,2-divinyladamantane (DVA), a single-cage adamantane molecule with
two vinyl (-CH=CH2) groups bonded to the same carbon
atom in the cage, then dispersed this molecule onto a polished hydrogen-terminated
Si(111) surface. Upon exposure to UV irradiation, photochemical
double hydrosilylation occurs, fixing the adamantane molecule through
two -C-C- tethers to two adjacent silicon atoms on the Si(111) surface
with minimal steric strain. A rinse with ethanol, deionized water,
and a 10 minute sonication with dichloromethane removed all ungrafted
or physisorbed DVA. All adamantane molecules that become tethered
to the surface via two bonds adopt the identical geometric orientation
relative to the surface. Giraud et al [162]
note that formation of the C-Si bond between the adamantane molecule
and the silicon surface can be achieved by adapting any one of several
commonly known techniques, including radical mediated hydrosilylation
of olefins with molecular silanes [165-167],
photochemical hydrosilylation of olefins with trichlorosilane [168],
or hydrosilylation of olefins catalyzed by transition metal complexes
[169-173].
2.3 STEP 3: Attach Handle
Structure to Tooltip Molecule
STEP 3. Attach
a large handle molecule or other handle structure to the deposition
surface-bound tooltip molecule created in Step
2. There are two general methods that may be used to accomplish
this: nanocrystal growth (Section 2.3.1) and
direct handle bonding (Section 2.3.2).
2.3.1 Handle Attachment Method A: Nanocrystal
Growth
In Method A, a bulk diamond deposition process
(see below) is applied simultaneously to the entire tooltip-containing
deposition surface (e.g., ~1 cm2) created in Step
2. The adamantane (diamond nanocrystal) base of each bound tooltip
molecule serves as a nucleation seed from which a large diamond
crystal will grow outward, in preference to growth on areas of the
deposition surface where tooltip nucleation seed molecules are absent
(Figure 14). Deposition should proceed until
a sufficient quantity of bulk diamond crystal has grown outward
and around the tooltip seed molecule such that the tooltip and its
newly grown handle can be securely grasped by a MEMS-scale manipulator
mechanism. The deposition process should be halted before adjacent
growing crystals merge into a single film. As noted in Section
2.2, the number density of tools on the surface is controlled
by limiting the number density of tooltip seed molecules attached
to the deposition surface during Step 2. As
distinguished from the more complex ex post strategy of chemically
attaching a capped tooltip molecule to a larger prefabricated handle
molecule, in the process described here the handle is grown directly
onto the surface-bound tooltip, creating an optimally rigid and
durable unitary mechanosynthetic tool structure. Alternatively and
less preferred, the growing diamond crystal handle structure can
be covalently bonded to some other appropriate large rigid structure
such as a CNT, tungsten, or diamond-shard AFM tip, or an EBID/FIB-deposited
metal or carbon column, e.g., by growing a vertical column of DLC
atop the properly oriented tooltip molecule using a focused beam
of hydrocarbon or C+ ions [114-118].
Figure 14. Multiply twinned diamond
crystal growth during hot-filament assisted CVD. Photos courtesy
of John C. Angus, Case Western Reserve University [174]
The most useful bulk deposition process is conventional
diamond CVD, wherein micron/hour or faster deposition rates are
typically demonstrated experimentally. The initial deposition rate
onto the starting seed may be slow, but this rate should rapidly
increase as more of the diamond handle structure is laid down during
the deposition process which will require times on the order of
hours. Traditional high-temperature CVD uses a large excess of atomic
hydrogen which will etch a graphite or graphene surface, but CVD
diamond can be deposited slowly at temperatures as low as 280-350
oC if necessary using the nonhydrogenic Argonne Lab C60/C2-dimer
approach [175, 176] (Section
1.1(C)) which uses very little atomic H, in which case graphene
etching would no longer be a serious problem. (Thermal suppression
of nucleation at 1000 oC has been discussed by McCune
[3].)
Does the CVD process deposit sp3-bonded
diamond, not sp2-bonded graphite, onto such a tiny nucleation
seed as the triadamantane base structure of the tooltip molecule?
Conditions in vapor deposition of thin films require a critical
nucleus size only on the order of a few atoms [177].
Under these conditions the free energy of formation of a critical
nucleus may be negative [177] and the surface
energy contribution may cause a reverse effect on the graphite-diamond
phase stability [178, 179],
a situation called nonclassical nucleation process [177].
Simple thermodynamic calculations by Badziag et al [180]
and others [178, 179] have
confirmed that hydrogen-terminated diamond nuclei <3 nm in diameter
should have a lower energy than hydrogen-terminated graphite nuclei
with the same number of carbon atoms, and that for surface bonds
terminated with H atoms, diamonds smaller than ~3 nm are energetically
favored over polycyclic aromatics (the precursors to graphite).
In 1983, Matsumato and Matsui [19],
and later in 1990, Sato [20] and Olah [21],
suggested that hydrocarbon cage molecules such as adamantane, bicyclooctane,
tetracyclododecane, hexacyclopentadecane, and dodecahedrane could
possibly serve as embryos for the homogeneous nucleation of diamond
in gas phase. The adamantane molecule (C10M/sub>H16)
is the smallest combination of carbon atoms possessing the diamond
unit cage structure, i.e., three six-member rings in a chair conformation.
The tetracyclododecane and hexacyclopentadecane molecules represent
twinned diamond embryos that were proposed as precursors to the
fivefold twinned diamond microcrystals prevalent in CVD diamond
films – from simple atomic structure comparisons, the diamond
lattice is easily generated from these cage compounds by simple
hydrogen abstraction followed by carbon addition [7].
However, in one experiment adamantane placed on a molybdenum deposition
surface during acetylene-oxygen combustion CVD failed to nucleate
diamond growth [181], possibly due to “a
fast transformation of adamantane on molybdenum to molybdenum carbide
under diamond growth conditions.”
The first successful demonstration of the ability
of surface-bound single-cage adamantane molecules to serve as nucleation
seeds for diamond CVD was achieved experimentally by the Giraud
group [161-164] during 1998-2001.
In this process, a special seed molecule – 2,2-divinyladamantane
(DVA), a single-cage adamantane with two vinyl (-CH=CH2)
groups bonded to the same carbon atom in the cage–is synthesized
using conventional solution phase techniques [161],
then dispersed onto a polished hydrogen-terminated Si(111) surface.
When a surface prepared in this way is subjected to microwave plasma
CVD using an H2-rich 1% CH4 feedstock gas
at 40 mbar and 850 oC for 2 hours, only a few diamond
grains are observed during subsequent SEM inspection, with a nucleation
density below ~104 cm-2 [163].
However, when the surface is additionally exposed to UV irradiation
from a xenon arc lamp for 24 hours prior to CVD, photochemical double
hydrosilylation occurs, fixing the seed molecule via two -C-C- tethers
to two adjacent silicon atoms on the Si(111) surface with minimal
steric strain. With the seed molecule thus tethered to the silicon
surface, the CVD process is then run again as previously described,
this time resulting in a diamond nucleation density that rises to
~109 cm-2 and producing a very homogeneous
diamond size of ~2 microns [163] (indicating
essentially all adamantane-based nucleations), as shown in Figure
15.
Figure 15. SEM photograph of uniform
2-micron diamond crystals grown by MPCVD using surface-tethered
single-cage adamantane molecules as nucleation seeds on a Si(111)
surface; image courtesy of Luc Giraud [163]
Giraud et al [163] notes
that although the treatment should densely cover the surface with
covalently bound adamantane seed molecules, “the subsequent
CVD plasma conditions will remove all the singly and presumably
a few doubly attached molecules. The fact that nucleated diamonds
were effectively obtained...shows the stability of grafted DVA in
the nucleation conditions. All the samples treated without...UV...suffered
no nucleation. This nucleation method therefore offers, on top of
the advantage of flexibility and mildness, the possibility of photolithographic
nucleation: diamonds adopt a homogeneous spatial repartition in
the center of the irradiated region, with a well-faceted shape due
to their cubic structure, while nucleation density sharply decreases
to ~5 x 106 cm-2 on the brink of the irradiated
region without even using a light mask.” In sum, doubly bonded
adamantane seed molecules nucleate the growth diamond “handle”
crystals, whereas singly bonded or unbonded seed molecules are removed
by the hot CVD process and thus produce no crystal growth.
Even though the core of the tooltip molecule
is iceane (the unit cell of hexagonal diamond or lonsdaleite) and
not pure adamantane as in conventional cubic diamond crystal, lonsdaleite
can also be grown experimentally [73-76].
The Raman spectra of lonsdaleite has been reported [182]
and detected in localized stacking defect domains in textured CVD
films [183]. Crystals of hexagonal diamond have
been prepared in both static and shock high-pressure laboratory
experiments [184, 185],
and directly from cubic diamond [186]. Lonsdaleite
can also be reliably synthesized [187] using
rf-assisted plasma CVD and pure acetylene gas as the carbon source
with no hydrogen – Roul et al [188] reports
that crystallites grown on Si(100) substrates consisted mainly of
polytypes of hexagonal diamond with a little cubic diamond and a
few higher-order hydrocarbon phases, and others have found diamond
polytypes in CVD diamond films [189]. Both cis
and trans boat-boat bicyclodecane and related multiply-twinned compounds
have been suggested as possible lonsdaleite nucleators based on
the presence of both boat and chair hexagonal carbon rings [190,
191]. Twinning – the stacking of alternating
(as in lonsdaleite) or arbitrarily-ordered re-entrant and intersecting
chair and boat planes – is commonly seen in CVD diamond [191-195].
A semi-empirical theoretical analysis of the lonsdaleite structure
by Burgos et al [196] gives results in reasonable
accord with the limited experimental data. L.V. Zhigilei et al [197]
note that intermediate states during the reconstruction of the C(111)
surface of cubic diamond can lead to growth processes which result
in the formation of a stacking fault, or twin plane [198-200],
which could in turn produce lonsdaleite [201],
and other transition mechanisms have been proposed [202].
As noted by Battaile et al [203],
experimentally grown CVD diamond crystallites can exhibit C(100)
and C(111) facets [204-206].
The C(110) surfaces are not usually observed (except in (110)-oriented
homoepitaxy [207, 208])
because they grow much faster than the C(111) and C(100) faces [204,
210], hence are normally terminated by (100)
and (111) facets. Diamond deposition rates in a hot-filament CVD
reactor at 1200 K from methyl radical are typically 1.3-2.0 'm/hr
for C(110) [209, 210] but
only 0.5 'm/hr for C(111) and just 0.4-0.5 'm/hr for C(100) [209-212].
With the tooltip molecule bound to the deposition surface in the
preferred orientation (i.e., inverted), the C(110) plane is angled
at 45o from vertical, leaning away from the vertical
centerline; the C(100) plane is also angled at 45o from
vertical, but leans toward the vertical centerline; the C(111) plane
goes straight up along the centerline. So under CVD deposition,
the tool handle structure will grow fastest outward at 45o.
The C(100) plane will be buried inside the tool, and the tool handle
crystal will exhibit C(110) facets on the sides and a C(111) facet
on the top. (Plasma CVD diamond crystallites grown on Si(100) wafers
also display a combination of C(111) and C(110) facets [6].)
Note that while lonsdaleite has a repeating structure, here we should
expect only a single twinning fault at the centerplane, not a series
of repeating twinnings. However, geometry dictates that the detached
tool cannot be concave on its active face, and would at worst be
flat, hence even at minimum can serve as a primitive tool to experimentally
demonstrate positionally controlled diamond mechanosynthesis.
Diamond films have been formed by immersing a
substrate in a fluid medium comprising a carbon-containing precursor
and irradiating the substrate with a laser to pyrolyze the precursor,
a technique that could also be adapted to grow diamond handle structures
onto isolated surface-bound tooltip molecules. For example, Hacker
et al [213] describe a process in which gas
containing an aliphatic acid or an aromatic carboxylic anhydride
that vaporizes without decomposition is passed over a substrate
and irradiated with a focused high-powered pulsed laser, depositing
a diamond film. In the process disclosed by Neifeld [214],
the substrate is immersed in a liquid containing carbon and hydrogen,
e.g. methanol, and a laser pulse is then directed through the liquid
coating to heat the substrate. The liquid is pyrolyzed and carbon
material from the pyrolyzed liquid grows on the substrate to form
a diamond coating on the substrate. Yu [130]
applies a hydrocarbon layer to a substrate by the Langmuir-Blodgett
technique, then irradiates the surface with a laser (or e-beam,
x-rays, etc.) to decompose the layer of molecules at the surface
without influencing the substrate; after decomposition, the carbon
atoms rearrange on the surface of the substrate to form a DLC film.
Bovenkerk et al [4] proposes using an unusual
dual gas approach to CVD in which, for example, a hydrogen (H2)
or methane (CH4) feedstock gas is alternated with a carbon
tetraiodide (CI4) feedstock gas, with each exposure resulting
in the deposition of a new diamond monolayer on an existing diamond
substrate, and alternative lower-temperature CVD gas chemistries
are being investigated such as use of CO2-based [215]
or halogen-containing [216] gas mixtures. Finally,
laser heating of solid CO2 at 30-80 GPa pressure causes
the molecule to decompose into oxygen and diamond, revealing a new
region of the CO2 phase diagram with a boundary having
a negative P-T slope [217].
There are several other lesser-known alternatives
to CVD, ion beam deposition, and laser pyrolysis which might also
be adapted for growing the handle structure onto the surface-bound
tooltip molecule. Diamond film prepared by physical vapor deposition
has been described by Namba et al [218]. Liquid-phase
diamond synthesis in boiling benzene or in molten lead was reported
as early as 1905 [219], and more recently, a
2% yield of diamond from carbon tetrachloride in liquid sodium at
700oC [220] and the electrochemical
growth of diamond films below 50oC in liquid ethanol
[157] and in solutions of ammonium acetate in
liquid acetic acid [158], and also the hydrothermal
synthesis of diamond [221].
A final consideration is the overall temperature
stability of the bound tooltip molecule under the conditions of
CVD growth and related processes. One concern is that the tooltip
molecule might destabilize if heated to CVD temperatures. Pure adamantane
graphitizes at >480oC [60], and
early thermodynamic equilibrium calculations [222,
223] showed that these and similar low molecular
weight hydrocarbons are not stable at high temperatures (>600oC)
in the harsh CVD environment. Another concern is that at elevated
temperatures, the tooltip molecule might debond from the deposition
surface. However, the work of the Giraud group [161-164]
with the 2,2-divinyladamantane nucleation molecule for diamond CVD
confirms experimentally that adamantane molecules having two tethers
to a silicon deposition surface can survive at least 2 hours of
CVD conditions at 850oC without destabilizing or detaching
from the surface, although adamantanes with only one or no bonds
to the surface evidently may be detached or destroyed at these temperatures.
Table 8 gives the release energy (EJ
– EDoT) for a decapped tooltip molecule bound to
a Ge deposition surface as ~4.7 eV. If the activation energy (reaction
barrier) is of similar magnitude, then from the Arrhenius equation
(Section 2.2.2) the mean detachment time for
a decapped tooltip molecule bound to a Ge deposition surface at
850oC is ~5 x 107 sec (>1 year). For some
deposition surface materials the tooltip release energy (and reaction
barrier) can be considerably lower, so it may be necessary to employ
a lower-temperature CVD process to obtain an acceptably long thermal
detachment time for some substrates. Successful low-temperature
CVD of diamond crystallites or DLC films have been reported at temperatures
as low as 250-750 oC [224], 280-350
oC [175, 176],
300-500 oC [116], 350-600 oC
[128], >400 oC [110],
and <500 oC [10].
2.3.2 Handle Attachment Method B: Direct
Handle Bonding
In Method B, an SPM-manipulated dehydrogenated
diamond shard having a flat or convex tip is brought down vertically
onto a surface upon which tooltip molecules are attached. Retraction
of the tip pulls the tooltip molecule off the surface, yielding
a finished tool for diamond mechanosynthesis consisting of a tooltip
molecule mounted on the diamond shard with an active C2
dimer exposed at the tip, as illustrated in Figure
16.
Figure 16. Extraction of surface-bound
tooltip molecule via bonding to vertically inserted and retracted
dehydrogenated diamond C(110) probe manipulated via SPM
|
|
|
(A) Lower
|
(B) Bind
|
(C) Retract
|
The specific sequence of events is as follows:
(1) Prepare tooltip molecules. Bond tooltip
molecules to the deposition surface in the preferred orientation,
as described in Step 2 (Section
2.2).
(2) Mount diamond AFM tip. Mount a diamond
shard as the working tip of an AFM. The apex of the shard should
be flat or convex in cross-section, and the apical tip surface of
the shard should expose the diamond C(110) crystal face.
(3) Depassivate AFM tip. The AFM tip
is baked in vacuo at >1300 K to completely dehydrogenate the
entire diamond shard, including most importantly its C(110) apical
tip surface. The C(110) surface does not reconstruct during thermal
depassivation [225].
(4) Lower tip onto surface. The depassivated
diamond shard tip is positioned perpendicular to the deposition
surface upon which the tooltip molecules are affixed in the preferred
orientation. The shard tip is then lowered toward the deposition
surface (Figure 16A), in vacuo at room
temperature.
(5) Bind shard to tooltip molecule. As
the apical tip surface of the diamond shard reaches and contacts
the deposition surface, the many dangling bonds at the C(110) crystal
face of the apical tip surface bond with several carbon atoms in
the base of a tooltip molecule, displacing several passivating hydrogen
atoms which migrate to nearby dangling bonds on the diamond shard
apical tip surface (Figure 16B).
(6) Retract tip from surface. The diamond
shard is retracted from the deposition surface in the vertical direction.
The tooltip molecule is more strongly bonded to the shard, so the
vertical retraction of the shard causes the two bonds to the deposition
surface through the C2 dimer to break (Figure
16C), creating an active C2 dimer radical exposed at the apical
tip surface of the shard. The diamond shard is now an active tool
that can be employed in diamond mechanosynthesis.
The process for manufacturing a mechanosynthetic
tool via Method B is much inferior to the Method A process for a
number of reasons. First, in Method B, after contacting the surface
it will be uncertain how many, if any, tooltip molecules have become
bonded to the apical tip surface of the diamond shard probe. Second,
after the bonds to the deposition surface through the C2
dimer have been broken, the tooltip molecule is free to rotate and
may form additional bonds between the tooltip molecule base and
the depassivated apical tip surface, most likely carrying the tooltip
molecule out of its vertical orientation and placing it in some
unknown, possibly useless, orientation. Third, if the tooltip molecule
is bonded to the diamond shard probe through only a minimal number
of bonds then the tool may be far less rigid than the solid crystalline
tool created by Method A, and thus may be incapable of transmitting
the full range of magnitudes and directions of forces that may be
required in mechanosynthetic operations. Finally, if the tooltip
molecule is bonded to the diamond shard probe through bonds in various
numbers and different crystallographic positions, then the position,
vibrations, and other important characteristics of the tool will
be far less predictable than the tool created by Method A, and the
positional uncertainty of dimer placement may be much greater, possibly
unacceptably high for many applications, even if the tool is operated
at LN2 or lower temperatures. Nevertheless, Method B
is a considerably easier process from an experimental standpoint
and so it may be possible to manufacture early, though less capable,
mechanosynthetic tools in this manner.
2.4 STEP 4: Separate Finished
Tool from Deposition Surface
STEP 4. Mechanically
grasp and break away the diamond crystal-handled tool from the deposition
surface, in vacuo. The covalent bond between the tooltip (through
the C2 dimer) and the surface will mechanically break
(Table 8), yielding either a tool with a naked
carbon dimer attached (i.e., a charged, active mechanosynthetic
tool; Figure 17A) or a tool with no dimer
attached (i.e., a “discharged” tool needing recharge,
e.g., with acetylene; Figure 17B). Ideally,
handle diamond near the tooltip forms only weak van der Waals bonds
to the deposition surface, so tool breakaway produces few or no
unwanted dangling bonds near the active tip. If deemed necessary,
each tool can be further machined or shaped via laser-, e-beam-,
or ion-beam-ablation to provide any desired aspect ratio for the
finished tool, or to provide any necessary larger-scale features
on the handle surface such as slots, grooves, or ridges, prior to
separation of the tool from the surface. This toolbuilding process
should work for any carbon dimer deposition tooltip of similar type,
as long as the capping group and the deposition surface are judiciously
chosen for each case. Note also that the discharged dimer deposition
tool can often be employed as a dimer removal tool [38],
at least in the case of isolated dimers on a mechanosynthetic workpiece,
permitting limited rework capability during subsequent mechanosynthetic
operations using the tools produced by the present invention.
Figure 17. Idealized mechanosynthetic
tool handle structure (passivating hydrogen atoms not shown)
|
|
(A) active C2 dimer bound on tip
|
(B) C2 dimer discharged from tip
|
Following the completion of Step
3 but prior to the commencement of Step 4,
the mechanosynthetic tools grown on the deposition surface in Step
3 may be stably stored indefinitely at room temperature under
an inert atmosphere. Prior to the commencement of Step
4, the deposition surface containing the bound tools should
be baked in vacuo at a temperature high enough to drive off any
physisorbed impurities that may have accumulated on the surface
or handle structure during storage, but at a temperature low enough
to avoid significant dehydrogenation of the diamond handle crystal.
Hydrogen desorption becomes measurable at 800-1100 K for the C(111)
diamond surface [226], 1400 K for the C(110)
surface [227], and possibly as low as 623 K
for the C(100) surface [228]. Taking Tbake
= 600 K and the dimer-to-surface C-C bond energy Ebond
= 556 zJ [32], then the minimum thermal detachment
time is given by the Arrhenius equation as tdetach ~
[(kBTbake/h) exp(-Ebond/kBTbake)]-1
= 1.1 x 1016 sec, where h = 6.63 x 10-34 J-sec
(Planck’s constant) and kB, = 1.381 x 10-23
J/K (Boltzmann’s constant).
The minimum force required to break a C-C bond
in a characteristic bond cleavage time of ~0.1 ns at 300 K is estimated
as ~4.4 nN and ~4.0 nN for a C-Si bond, and the threshold stress
for breaking two C-C bonds “mechanically constrained to cleave
in a concerted process” is ~6 nN per bond [32].
Hence the force required to simultaneously break both of the bonds
between the two tooltip dimer carbon atoms and the two deposition
surface atoms to which they are attached, during tool separation
in Step 4, is likely on the order of 8-12 nN.
However, a much larger van der Waals attraction may exist between
the diamond tool handle crystal and the deposition surface. For
example, two opposed hydrogenated diamond C(111) surfaces equilibrate
at ~2.3 ' separation, according to a simple molecular mechanics
(MM+) simulation. Assuming no additional covalent bonds have formed
between tool and deposition surface except through the C2
dimer at the tooltip, two planar surfaces of area A ~ 1 'm2
with Hamaker constant H ~ 300 zJ (i.e., diamond, Si, Ge, graphite,
metal surfaces) separated by a distance s ~ 2.3 ' experience an
attractive force [32, 93]
of F ~ HA/12ps3 ~ 650,000 nN. Even if the contact interface
is only 100 nm2 the attractive force is still F ~ 65
nN, an order of magnitude larger than the force required to break
each of the two covalent bonds between deposition surface and C2
dimer. The separation force required to snap the finished tool free
from the deposition surface, assuming no rogue covalent bonds, is
therefore on the order of 102-106 nN. For
comparison, the force of gravity on a 1 'm3 diamond crystal
is ~0.00003 nN and the force from a 10,000-g shock impact acceleration
(e.g., dropping object on concrete floor) produces a lateral accelerative
force of only 0.3 nN.
Additionally, the flexural strength of diamond
is 23 times greater than that of silicon, permitting much greater
forces to be applied to the tool handle element without breakage;
if the diamond handle crystal should contact the substrate which
it overhangs, its low coefficient of static friction ensures that
the diamond crystal will not adhere to the substrate [18].
Note that in one combustion CVD experiment with adamantane-seeded
diamond growth on Mo (a carbide-forming surface; Table
7) [181], it was observed that “the
diamond crystals show a low adhesion on the molybdenum substrate.”
Differential thermal expansion during post-CVD cooling causes the
built tool and the deposition surface to shrink differently, creating
stresses and possibly prematurely breaking off the tool; a similar
technique allows a grown diamond film to separate as an integral
diamond sheet on cooling.
The need to securely grip and apply forces against
mechanical resistance during the tool separation process, while
retaining precise positional knowledge in all coordinate and rotational
axes, imposes specific operational requirements for the gripper
and manipulator system. Since the bondlength between C2
dimer and deposition surface is ~1.5 ', and since these bonds cannot
tolerate excessive stretching before breaking, the manipulator system
should have a repeatable positioning resolution of at least DRmin
~ 2 '. Subsequent mechanosynthetic operations on diamond surfaces
will likely require repeatable positional accuracies of at least
0.5 ', and in some cases as little as 0.2 ' [38,
235], or about tenfold better than for mere
tool separation alone. Since handle crystals are of slightly different
size, shape, and orientation, it is also important to avoid excessively
rotating the handle as it is being grasped in preparation for tool
separation from the deposition surface. A handle crystal of radius
Rhandle = 1 mm and a minimum allowable displacement of
DRmin = 2 ' implies a minimum allowable rotation of Dqmin
= sin-1(DRmin/Rhandle) ~ 200 'rad, or 20 'rad
for mechanosynthesis operations where DR = 0.2 '. A further requirement
is the ability of the manipulator to apply incremental forces along
various translational or rotational vectors of DFmin
= 102-106 nN.
The Zyvex S100 Nanomanipulator [229]
achieves a rotational accuracy of DqS100 = 2 'rad <<
Dqmin = 20-200 'rad, as required. The S100 grippers provide
a maximum gripping force of 550,000 nN ~ DFmin, which
should be adequate in most cases. However, the repeatable positional
accuracy of the S100 is only 50 ', or 25 times coarser than the
~2 ' required for controlled tool separation and ~100-250 times
coarser than the 0.2-0.5 ' required for accurate mechanosynthesis
[235]. The Klocke Nanotechnik Nanomanipulator
claims 20 ' step sizes and 10 ' positional accuracy without backlash
[230], still not quite good enough. Nevertheless,
in a somewhat different context scanning with AFM tips may be undertaken
with the ~0.1 ' accuracy that would be required during room temperature
mechanosynthesis operations. By premeasuring the exact positions
of all viable tooltip molecules attached to the deposition surface,
and then carefully tracking all positional and rotational motions
that are subsequently applied to the tool, the exact 3D spatial
position of the active tool dimer may be continuously estimated
with sufficient accuracy.
Once the completed mechanosynthetic tool has
been detached from the deposition surface, the exposed C2
dimer radical is extremely chemically active. According to an AM1
simulation, an activated DCB6-Ge tooltip is energetically preferred
to combine with incident O2 molecules by 6.7 eV and with
incident N2 molecules by 2.8 eV, the principal constituents
of air, the most likely environmental contaminant. Since any laboratory
vacuum is imperfect, stray atoms, ions, and molecules will populate
the vacuum chamber at some low concentration and will eventually
impinge upon an unused active tooltip, reacting with it and rendering
it useless for further mechanosynthetic work.
Using the standard formula for molecular incident
rate [231], the mean lifetime ttool of an active
DCB6-Ge tooltip exposed to vacuum with a partial pressure Patm of
contaminant molecules having molar mass molar (kg/mole)
at temperature T, is given by: ttool = (Nhits
Vmolar / Atarget Patm NA)
(p Mmolar / 2 kBT NA)1/2
(seconds), where the number of encounters between an active tooltip
and a contaminant molecule that are required to deactivate the tooltip
is taken as Nhits = 1, the molar gas volume Vmolar
= 22.4141 x 10-3 m3-atm/mole, Atarget ~ 2
'2 is the cross-sectional area of the exposed C2
dimer impact target (analogous to the room temperature dimer atom
positional uncertainty footprint described in [38]),
T = 77 K (LN2 temperatures), NA = 6.023 x 1023
molecules/mole (Avogadro’s number), and kB = 1.381 x 10-23
J/K (Boltzmann’s constant). Expressing pressure as Ptorr
= 760 Patm in torr and rearranging terms, then Ptorr
= (2.2 x 10-6) / ttool (torr) for hydrogen
atoms (H) having molar mass Mmolar = 1 x 10-3
kg/mole; Ptorr = (1.2 x 10-5) / ttool
(torr) for nitrogen molecules (N2) having molar mass
Mmolar = 28 x 10-3 kg/mole and Ptorr
= (1.3 x 10-5) / ttool (torr) for oxygen molecules
(O2) having molar mass Mmolar = 32 x 10-3
kg/mole, the two most likely contaminant molecules from the ambient
environment. To ensure a mean tooltip lifetime of ttool
= 1000 sec requires maintaining a partial pressure Ptorr = 2.2 x
10-9 torr for H atoms, Ptorr = 1.2 x 10-8
torr for N2 and Ptorr = 1.3 x 10-8
torr for O2. Ultrahigh vacuums (UHV) of 10-7-10-10
torr have been commonly accessible experimentally for many decades
[232], and vacuums as high as 10-15
torr have been created in the laboratory [233].
Note that a vacuum of 10-9 torr inside an enclosed 10,000
cubic micron box contains, on average, far less than one contaminant
molecule – usually making, in effect, a perfect vacuum and
allowing, in principle, an unrestricted tooltip lifetime.
Links to Additional Papers by Robert Freitas:
Kinematic
Self-Replicating Machines
Theoretical
Analysis of a Carbon-Carbon Dimer Placement Tool for Diamond Mechanosynthesis
Theoretical Analysis of Diamond
Mechanosynthesis.
Part I. Stability of Mediated Growth of Nanocryalline Diamond C(110)
Surface
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